Wafer-Scale Synthesis of WS(2) Films with In Situ Controllable p-Type Doping by Atomic Layer Deposition

Wafer-scale synthesis of p-type TMD films is critical for its commercialization in next-generation electro/optoelectronics. In this work, wafer-scale intrinsic n-type WS(2) films and in situ Nb-doped p-type WS(2) films were synthesized through atomic layer deposition (ALD) on 8-inch α-Al(2)O(3)/Si w...

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Detalles Bibliográficos
Autores principales: Yang, Hanjie, Wang, Yang, Zou, Xingli, Bai, Rongxu, Wu, Zecheng, Han, Sheng, Chen, Tao, Hu, Shen, Zhu, Hao, Chen, Lin, Zhang, David W., Lee, Jack C., Lu, Xionggang, Zhou, Peng, Sun, Qingqing, Yu, Edward T., Akinwande, Deji, Ji, Li
Formato: Online Artículo Texto
Lenguaje:English
Publicado: AAAS 2021
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8672204/
https://www.ncbi.nlm.nih.gov/pubmed/34957405
http://dx.doi.org/10.34133/2021/9862483

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8672204/
https://www.ncbi.nlm.nih.gov/pubmed/34957405
http://dx.doi.org/10.34133/2021/9862483

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