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All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience

Ultimately soft electronics seek affordable and high mechanical performance universal self‐healing materials that can autonomously heal in harsh environments within short times scales. As of now, such features are not found in a single material. Herein, interpenetrated elastomer network with bimodal...

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Autores principales: Tolvanen, Jarkko, Nelo, Mikko, Hannu, Jari, Juuti, Jari, Jantunen, Heli
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8693070/
https://www.ncbi.nlm.nih.gov/pubmed/34664423
http://dx.doi.org/10.1002/advs.202103235
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author Tolvanen, Jarkko
Nelo, Mikko
Hannu, Jari
Juuti, Jari
Jantunen, Heli
author_facet Tolvanen, Jarkko
Nelo, Mikko
Hannu, Jari
Juuti, Jari
Jantunen, Heli
author_sort Tolvanen, Jarkko
collection PubMed
description Ultimately soft electronics seek affordable and high mechanical performance universal self‐healing materials that can autonomously heal in harsh environments within short times scales. As of now, such features are not found in a single material. Herein, interpenetrated elastomer network with bimodal chain length distribution showing rapid autonomous healing in universal conditions (<7200 s) with high efficiency (up to 97.6 ± 4.8%) is reported. The bimodal elastomer displays strain‐induced photoelastic effect and reinforcement which is responsible for its remarkable mechanical robustness (≈5.5 MPa stress at break and toughness ≈30 MJ m(−3)). The entropy‐driven elasticity allows an unprecedented shape recovery efficiency (100%) even after fracturing and 100% resiliency up to its stretching limit (≈2000% strain). The elastomers can be mechanically conditioned leading to a state where they recover their shape extremely quickly after removal of stress (nearly order of magnitude faster than pristine elastomers). As a proof of concept, universal self‐healing mechanochromic strain sensor is developed capable of operating in various environmental conditions and of changing its photonic band gap under mechanical stress.
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spelling pubmed-86930702022-01-03 All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience Tolvanen, Jarkko Nelo, Mikko Hannu, Jari Juuti, Jari Jantunen, Heli Adv Sci (Weinh) Research Articles Ultimately soft electronics seek affordable and high mechanical performance universal self‐healing materials that can autonomously heal in harsh environments within short times scales. As of now, such features are not found in a single material. Herein, interpenetrated elastomer network with bimodal chain length distribution showing rapid autonomous healing in universal conditions (<7200 s) with high efficiency (up to 97.6 ± 4.8%) is reported. The bimodal elastomer displays strain‐induced photoelastic effect and reinforcement which is responsible for its remarkable mechanical robustness (≈5.5 MPa stress at break and toughness ≈30 MJ m(−3)). The entropy‐driven elasticity allows an unprecedented shape recovery efficiency (100%) even after fracturing and 100% resiliency up to its stretching limit (≈2000% strain). The elastomers can be mechanically conditioned leading to a state where they recover their shape extremely quickly after removal of stress (nearly order of magnitude faster than pristine elastomers). As a proof of concept, universal self‐healing mechanochromic strain sensor is developed capable of operating in various environmental conditions and of changing its photonic band gap under mechanical stress. John Wiley and Sons Inc. 2021-10-18 /pmc/articles/PMC8693070/ /pubmed/34664423 http://dx.doi.org/10.1002/advs.202103235 Text en © 2021 The Authors. Advanced Science published by Wiley‐VCH GmbH https://creativecommons.org/licenses/by/4.0/This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
spellingShingle Research Articles
Tolvanen, Jarkko
Nelo, Mikko
Hannu, Jari
Juuti, Jari
Jantunen, Heli
All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience
title All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience
title_full All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience
title_fullStr All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience
title_full_unstemmed All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience
title_short All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience
title_sort all‐around universal and photoelastic self‐healing elastomer with high toughness and resilience
topic Research Articles
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8693070/
https://www.ncbi.nlm.nih.gov/pubmed/34664423
http://dx.doi.org/10.1002/advs.202103235
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