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Study on the Mechanism of Solid-Phase Oxidant Action in Tribochemical Mechanical Polishing of SiC Single Crystal Substrate

Na(2)CO(3)—1.5 H(2)O(2), KClO(3), KMnO(4), KIO(3), and NaOH were selected for dry polishing tests with a 6H-SiC single crystal substrate on a polyurethane polishing pad. The research results showed that all the solid-phase oxidants, except NaOH, could decompose to produce oxygen under the frictional...

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Detalles Bibliográficos
Autores principales:	Qi, Wanting, Cao, Xiaojun, Xiao, Wen, Wang, Zhankui, Su, Jianxiu
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2021
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8703796/ https://www.ncbi.nlm.nih.gov/pubmed/34945397 http://dx.doi.org/10.3390/mi12121547

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