Cargando…
Design and Fabrication of Double-Layer Crossed Si Microchannel Structure
A four-step etching method is used to prepare the double-layer cross Si microchannel structure. In the first etching step, a <100> V-groove structure is etched on (100) silicon, and the top channel is formed after thermal oxidation with the depth of the channel and the slope of its sidewall be...
| Autores principales: | , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8706412/ https://www.ncbi.nlm.nih.gov/pubmed/34945407 http://dx.doi.org/10.3390/mi12121557 |