Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films

A single-walled carbon nanotube (SWCNT)-silica composite thin film on a quartz glass was formed by ultraviolet irradiation (20–40 °C) onto a spin-coated precursor film. With 7.4 mass% SWCNTs, the electrical resistivity reached 7.7 × 10(−3) Ω·cm after UV-irradiation. The transmittance was >80% at...

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Autores principales: Ogawa, Naoki, Nagai, Hiroki, Kudoh, Yukihiro, Onuma, Takeyoshi, Murayama, Taichi, Nojima, Akinobu, Sato, Mitsunobu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8707605/
https://www.ncbi.nlm.nih.gov/pubmed/34947753
http://dx.doi.org/10.3390/nano11123404
_version_ 1784622477088915456
author Ogawa, Naoki
Nagai, Hiroki
Kudoh, Yukihiro
Onuma, Takeyoshi
Murayama, Taichi
Nojima, Akinobu
Sato, Mitsunobu
author_facet Ogawa, Naoki
Nagai, Hiroki
Kudoh, Yukihiro
Onuma, Takeyoshi
Murayama, Taichi
Nojima, Akinobu
Sato, Mitsunobu
author_sort Ogawa, Naoki
collection PubMed
description A single-walled carbon nanotube (SWCNT)-silica composite thin film on a quartz glass was formed by ultraviolet irradiation (20–40 °C) onto a spin-coated precursor film. With 7.4 mass% SWCNTs, the electrical resistivity reached 7.7 × 10(−3) Ω·cm after UV-irradiation. The transmittance was >80% at 178–2600 nm, and 79%–73% at 220–352 nm. Heat treatment increased the transparency and pencil hardness, without affecting the low electrical resistivity. Raman spectroscopy and microscopic analyses revealed the excellent film morphology with good SWCNT dispersal. The low refractive index (1.49) and haze value (<1.5%) are invaluable for transparent windows for novel optoelectronic devices.
format Online
Article
Text
id pubmed-8707605
institution National Center for Biotechnology Information
language English
publishDate 2021
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-87076052021-12-25 Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films Ogawa, Naoki Nagai, Hiroki Kudoh, Yukihiro Onuma, Takeyoshi Murayama, Taichi Nojima, Akinobu Sato, Mitsunobu Nanomaterials (Basel) Article A single-walled carbon nanotube (SWCNT)-silica composite thin film on a quartz glass was formed by ultraviolet irradiation (20–40 °C) onto a spin-coated precursor film. With 7.4 mass% SWCNTs, the electrical resistivity reached 7.7 × 10(−3) Ω·cm after UV-irradiation. The transmittance was >80% at 178–2600 nm, and 79%–73% at 220–352 nm. Heat treatment increased the transparency and pencil hardness, without affecting the low electrical resistivity. Raman spectroscopy and microscopic analyses revealed the excellent film morphology with good SWCNT dispersal. The low refractive index (1.49) and haze value (<1.5%) are invaluable for transparent windows for novel optoelectronic devices. MDPI 2021-12-16 /pmc/articles/PMC8707605/ /pubmed/34947753 http://dx.doi.org/10.3390/nano11123404 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Ogawa, Naoki
Nagai, Hiroki
Kudoh, Yukihiro
Onuma, Takeyoshi
Murayama, Taichi
Nojima, Akinobu
Sato, Mitsunobu
Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
title Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
title_full Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
title_fullStr Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
title_full_unstemmed Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
title_short Fabrication of Transparent and Conductive SWCNT/SiO(2) Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
title_sort fabrication of transparent and conductive swcnt/sio(2) composite thin-film by photo-irradiation of molecular precursor films
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8707605/
https://www.ncbi.nlm.nih.gov/pubmed/34947753
http://dx.doi.org/10.3390/nano11123404
work_keys_str_mv AT ogawanaoki fabricationoftransparentandconductiveswcntsio2compositethinfilmbyphotoirradiationofmolecularprecursorfilms
AT nagaihiroki fabricationoftransparentandconductiveswcntsio2compositethinfilmbyphotoirradiationofmolecularprecursorfilms
AT kudohyukihiro fabricationoftransparentandconductiveswcntsio2compositethinfilmbyphotoirradiationofmolecularprecursorfilms
AT onumatakeyoshi fabricationoftransparentandconductiveswcntsio2compositethinfilmbyphotoirradiationofmolecularprecursorfilms
AT murayamataichi fabricationoftransparentandconductiveswcntsio2compositethinfilmbyphotoirradiationofmolecularprecursorfilms
AT nojimaakinobu fabricationoftransparentandconductiveswcntsio2compositethinfilmbyphotoirradiationofmolecularprecursorfilms
AT satomitsunobu fabricationoftransparentandconductiveswcntsio2compositethinfilmbyphotoirradiationofmolecularprecursorfilms

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