Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology

An on-wafer micro-detector for in situ EUV (wavelength of 13.5 nm) detection featuring FinFET CMOS compatibility, 1 T pixel and battery-less sensing is demonstrated. Moreover, the detection results can be written in the in-pixel storage node for days, enabling off-line and non-destructive reading. T...

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Autores principales: Wang, Chien-Ping, Lin, Burn Jeng, Wu, Pin-Jiun, Shih, Jiaw-Ren, Chih, Yue-Der, Chang, Jonathan, Lin, Chrong Jung, King, Ya-Chin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2022
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8733134/
https://www.ncbi.nlm.nih.gov/pubmed/34985604
http://dx.doi.org/10.1186/s11671-021-03645-5
_version_ 1784627734726574080
author Wang, Chien-Ping
Lin, Burn Jeng
Wu, Pin-Jiun
Shih, Jiaw-Ren
Chih, Yue-Der
Chang, Jonathan
Lin, Chrong Jung
King, Ya-Chin
author_facet Wang, Chien-Ping
Lin, Burn Jeng
Wu, Pin-Jiun
Shih, Jiaw-Ren
Chih, Yue-Der
Chang, Jonathan
Lin, Chrong Jung
King, Ya-Chin
author_sort Wang, Chien-Ping
collection PubMed
description An on-wafer micro-detector for in situ EUV (wavelength of 13.5 nm) detection featuring FinFET CMOS compatibility, 1 T pixel and battery-less sensing is demonstrated. Moreover, the detection results can be written in the in-pixel storage node for days, enabling off-line and non-destructive reading. The high spatial resolution micro-detectors can be used to extract the actual parameters of the incident EUV on wafers, including light intensity, exposure time and energy, key to optimization of lithographic processes in 5 nm FinFET technology and beyond.
format Online
Article
Text
id pubmed-8733134
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher Springer US
record_format MEDLINE/PubMed
spelling pubmed-87331342022-01-18 Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology Wang, Chien-Ping Lin, Burn Jeng Wu, Pin-Jiun Shih, Jiaw-Ren Chih, Yue-Der Chang, Jonathan Lin, Chrong Jung King, Ya-Chin Nanoscale Res Lett Nano Express An on-wafer micro-detector for in situ EUV (wavelength of 13.5 nm) detection featuring FinFET CMOS compatibility, 1 T pixel and battery-less sensing is demonstrated. Moreover, the detection results can be written in the in-pixel storage node for days, enabling off-line and non-destructive reading. The high spatial resolution micro-detectors can be used to extract the actual parameters of the incident EUV on wafers, including light intensity, exposure time and energy, key to optimization of lithographic processes in 5 nm FinFET technology and beyond. Springer US 2022-01-05 /pmc/articles/PMC8733134/ /pubmed/34985604 http://dx.doi.org/10.1186/s11671-021-03645-5 Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Nano Express
Wang, Chien-Ping
Lin, Burn Jeng
Wu, Pin-Jiun
Shih, Jiaw-Ren
Chih, Yue-Der
Chang, Jonathan
Lin, Chrong Jung
King, Ya-Chin
Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology
title Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology
title_full Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology
title_fullStr Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology
title_full_unstemmed Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology
title_short Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology
title_sort embedded micro-detectors for euv exposure control in finfet cmos technology
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8733134/
https://www.ncbi.nlm.nih.gov/pubmed/34985604
http://dx.doi.org/10.1186/s11671-021-03645-5
work_keys_str_mv AT wangchienping embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology
AT linburnjeng embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology
AT wupinjiun embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology
AT shihjiawren embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology
AT chihyueder embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology
AT changjonathan embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology
AT linchrongjung embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology
AT kingyachin embeddedmicrodetectorsforeuvexposurecontrolinfinfetcmostechnology

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