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ZnO-based MIS photodetectors

We report the fabrication of ZnO-based metal–insulator–semiconductor (MIS) and metal–semiconductor–metal (MSM) photodetectors. With 5 V applied bias, it was found that photocurrent to dark current contrast ratios of the ZnO MSM and MIS photodetectors were 2.9 × 10(2) and 3.2 × 10(4), respectively. I...

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Detalles Bibliográficos
Autores principales: Young, S.J., Ji, L.W., Chang, S.J., Liang, S.H., Lam, K.T., Fang, T.H., Chen, K.J., Du, X.L., Xue, Q.K.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier B.V. 2008
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8740771/
https://www.ncbi.nlm.nih.gov/pubmed/35041724
http://dx.doi.org/10.1016/j.sna.2007.06.003
Descripción
Sumario:We report the fabrication of ZnO-based metal–insulator–semiconductor (MIS) and metal–semiconductor–metal (MSM) photodetectors. With 5 V applied bias, it was found that photocurrent to dark current contrast ratios of the ZnO MSM and MIS photodetectors were 2.9 × 10(2) and 3.2 × 10(4), respectively. It was also found that measured responsivities were 0.089 and 0.0083 A/W for the ZnO MSM and MIS photodetectors, respectively, when the incident light wavelength was 370 nm. Furthermore, it was found that UV to visible rejection ratios for the fabricated ZnO MSM and MIS photodetectors were 2.4 × 10(2) and 3.8 × 10(3), respectively.