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Design of a Capacitance-to-Digital Converter Based on Iterative Delay-Chain Discharge in 180 nm CMOS Technology

The design of advanced miniaturized ultra-low power interfaces for sensors is extremely important for energy-constrained monitoring applications, such as wearable, ingestible and implantable devices used in the health and medical field. Capacitive sensors, together with their correspondent digital-o...

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Detalles Bibliográficos
Autores principales: Cicalini, Mattia, Piotto, Massimo, Bruschi, Paolo, Dei, Michele
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8747245/
https://www.ncbi.nlm.nih.gov/pubmed/35009664
http://dx.doi.org/10.3390/s22010121
Descripción
Sumario:The design of advanced miniaturized ultra-low power interfaces for sensors is extremely important for energy-constrained monitoring applications, such as wearable, ingestible and implantable devices used in the health and medical field. Capacitive sensors, together with their correspondent digital-output readout interfaces, make no exception. Here, we analyse and design a capacitance-to-digital converter, based on the recently introduced iterative delay-chain discharge architecture, showing the circuit inner operating principles and the correspondent design trade-offs. A complete design case, implemented in a commercial 180 nm CMOS process, operating at 0.9 V supply for a 0–250 pF input capacitance range, is presented. The circuit, tested by means of detailed electrical simulations, shows ultra-low energy consumption (≤1.884 nJ/conversion), excellent linearity (linearity error 15.26 ppm), good robustness against process and temperature corners (conversion gain sensitivity to process corners variation of 114.0 ppm and maximum temperature sensitivity of 81.9 ppm/ [Formula: see text] C in the −40 [Formula: see text] C, +125 [Formula: see text] C interval) and medium-low resolution of 10.3 effective number of bits, while using only 0.0192 mm [Formula: see text] of silicon area and employing 2.93 ms for a single conversion.