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Polynomial fitting method of background correction for electron backscatter diffraction patterns
A raw electron backscatter diffraction (EBSD) signal can be empirically decomposed into a Kikuchi diffraction pattern and a smooth background. For pattern indexing, the latter is generally undesirable but can reveal topographical, compositional, or diffraction contrast. In this study, we proposed a...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8748636/ https://www.ncbi.nlm.nih.gov/pubmed/35013512 http://dx.doi.org/10.1038/s41598-021-04407-0 |
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author | Tsai, Yi-Yun Pan, Yi-Chen Kuo, Jui-Chao |
author_facet | Tsai, Yi-Yun Pan, Yi-Chen Kuo, Jui-Chao |
author_sort | Tsai, Yi-Yun |
collection | PubMed |
description | A raw electron backscatter diffraction (EBSD) signal can be empirically decomposed into a Kikuchi diffraction pattern and a smooth background. For pattern indexing, the latter is generally undesirable but can reveal topographical, compositional, or diffraction contrast. In this study, we proposed a new background correction method using polynomial fitting (PF) algorithm to obtain clear Kikuchi diffraction patterns for some applications in nonconductive materials due to coating problems, at low accelerated voltage and at rough sample surfaces and for the requirement of high pattern quality in HR-EBSD. To evaluate the quality metrics of the Kikuchi patterns, we initially used three indices, namely, pattern quality, Tenengrad variance, and spatial–spectral entropy-based quality to detect the clarity, contrast, and noise of Kikuchi patterns obtained at 5 and 15 kV. Then, we examined the performance of PF method by comparing it with pattern averaging and Fourier transform-based methods. Finally, this PF background correction is demonstrated to extract the background images from the blurred diffraction patterns of EBSD measurements at low kV accelerating voltage and with coating layer, and to provide clear Kikuchi patterns successfully. |
format | Online Article Text |
id | pubmed-8748636 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-87486362022-01-11 Polynomial fitting method of background correction for electron backscatter diffraction patterns Tsai, Yi-Yun Pan, Yi-Chen Kuo, Jui-Chao Sci Rep Article A raw electron backscatter diffraction (EBSD) signal can be empirically decomposed into a Kikuchi diffraction pattern and a smooth background. For pattern indexing, the latter is generally undesirable but can reveal topographical, compositional, or diffraction contrast. In this study, we proposed a new background correction method using polynomial fitting (PF) algorithm to obtain clear Kikuchi diffraction patterns for some applications in nonconductive materials due to coating problems, at low accelerated voltage and at rough sample surfaces and for the requirement of high pattern quality in HR-EBSD. To evaluate the quality metrics of the Kikuchi patterns, we initially used three indices, namely, pattern quality, Tenengrad variance, and spatial–spectral entropy-based quality to detect the clarity, contrast, and noise of Kikuchi patterns obtained at 5 and 15 kV. Then, we examined the performance of PF method by comparing it with pattern averaging and Fourier transform-based methods. Finally, this PF background correction is demonstrated to extract the background images from the blurred diffraction patterns of EBSD measurements at low kV accelerating voltage and with coating layer, and to provide clear Kikuchi patterns successfully. Nature Publishing Group UK 2022-01-10 /pmc/articles/PMC8748636/ /pubmed/35013512 http://dx.doi.org/10.1038/s41598-021-04407-0 Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) . |
spellingShingle | Article Tsai, Yi-Yun Pan, Yi-Chen Kuo, Jui-Chao Polynomial fitting method of background correction for electron backscatter diffraction patterns |
title | Polynomial fitting method of background correction for electron backscatter diffraction patterns |
title_full | Polynomial fitting method of background correction for electron backscatter diffraction patterns |
title_fullStr | Polynomial fitting method of background correction for electron backscatter diffraction patterns |
title_full_unstemmed | Polynomial fitting method of background correction for electron backscatter diffraction patterns |
title_short | Polynomial fitting method of background correction for electron backscatter diffraction patterns |
title_sort | polynomial fitting method of background correction for electron backscatter diffraction patterns |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8748636/ https://www.ncbi.nlm.nih.gov/pubmed/35013512 http://dx.doi.org/10.1038/s41598-021-04407-0 |
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