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Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67...

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Autores principales: Miao, Yurun, Lee, Dennis T., de Mello, Matheus Dorneles, Ahmad, Mueed, Abdel-Rahman, Mohammed K., Eckhert, Patrick M., Boscoboinik, J. Anibal, Fairbrother, D. Howard, Tsapatsis, Michael
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8776825/
https://www.ncbi.nlm.nih.gov/pubmed/35058452
http://dx.doi.org/10.1038/s41467-022-28050-z
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author Miao, Yurun
Lee, Dennis T.
de Mello, Matheus Dorneles
Ahmad, Mueed
Abdel-Rahman, Mohammed K.
Eckhert, Patrick M.
Boscoboinik, J. Anibal
Fairbrother, D. Howard
Tsapatsis, Michael
author_facet Miao, Yurun
Lee, Dennis T.
de Mello, Matheus Dorneles
Ahmad, Mueed
Abdel-Rahman, Mohammed K.
Eckhert, Patrick M.
Boscoboinik, J. Anibal
Fairbrother, D. Howard
Tsapatsis, Michael
author_sort Miao, Yurun
collection PubMed
description Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.
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spelling pubmed-87768252022-02-04 Solvent-free bottom-up patterning of zeolitic imidazolate frameworks Miao, Yurun Lee, Dennis T. de Mello, Matheus Dorneles Ahmad, Mueed Abdel-Rahman, Mohammed K. Eckhert, Patrick M. Boscoboinik, J. Anibal Fairbrother, D. Howard Tsapatsis, Michael Nat Commun Article Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes. Nature Publishing Group UK 2022-01-20 /pmc/articles/PMC8776825/ /pubmed/35058452 http://dx.doi.org/10.1038/s41467-022-28050-z Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Article
Miao, Yurun
Lee, Dennis T.
de Mello, Matheus Dorneles
Ahmad, Mueed
Abdel-Rahman, Mohammed K.
Eckhert, Patrick M.
Boscoboinik, J. Anibal
Fairbrother, D. Howard
Tsapatsis, Michael
Solvent-free bottom-up patterning of zeolitic imidazolate frameworks
title Solvent-free bottom-up patterning of zeolitic imidazolate frameworks
title_full Solvent-free bottom-up patterning of zeolitic imidazolate frameworks
title_fullStr Solvent-free bottom-up patterning of zeolitic imidazolate frameworks
title_full_unstemmed Solvent-free bottom-up patterning of zeolitic imidazolate frameworks
title_short Solvent-free bottom-up patterning of zeolitic imidazolate frameworks
title_sort solvent-free bottom-up patterning of zeolitic imidazolate frameworks
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8776825/
https://www.ncbi.nlm.nih.gov/pubmed/35058452
http://dx.doi.org/10.1038/s41467-022-28050-z
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