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Characterization of Ti/SnO(2) Interface by X-ray Photoelectron Spectroscopy
The Ti/SnO(2) interface has been investigated in situ via the technique of x-ray photoelectron spectroscopy. Thin films (in the range from 0.3 to 1.1 nm) of titanium were deposited on SnO(2) substrates via the e-beam technique. The deposition was carried out at two different substrate temperatures,...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2022
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8780820/ https://www.ncbi.nlm.nih.gov/pubmed/35055221 http://dx.doi.org/10.3390/nano12020202 |