Improvement of Crystal Quality of AlN Films with Different Polarities by Annealing at High Temperature

High-quality AlN film is a key factor affecting the performance of deep-ultraviolet optoelectronic devices. In this work, high-temperature annealing technology in a nitrogen atmosphere was used to improve the quality of AlN films with different polarities grown by magnetron sputtering. After anneali...

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Detalles Bibliográficos
Autores principales: Yue, Yang, Sun, Maosong, Chen, Jie, Yan, Xuejun, He, Zhuokun, Zhang, Jicai, Sun, Wenhong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8780902/
https://www.ncbi.nlm.nih.gov/pubmed/35056294
http://dx.doi.org/10.3390/mi13010129

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8780902/
https://www.ncbi.nlm.nih.gov/pubmed/35056294
http://dx.doi.org/10.3390/mi13010129

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