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Improvement of Crystal Quality of AlN Films with Different Polarities by Annealing at High Temperature

High-quality AlN film is a key factor affecting the performance of deep-ultraviolet optoelectronic devices. In this work, high-temperature annealing technology in a nitrogen atmosphere was used to improve the quality of AlN films with different polarities grown by magnetron sputtering. After anneali...

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Detalles Bibliográficos
Autores principales:	Yue, Yang, Sun, Maosong, Chen, Jie, Yan, Xuejun, He, Zhuokun, Zhang, Jicai, Sun, Wenhong
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2022
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8780902/ https://www.ncbi.nlm.nih.gov/pubmed/35056294 http://dx.doi.org/10.3390/mi13010129

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