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Photo-oxidative degradation of polyacids derived ceria nanoparticle modulation for chemical mechanical polishing

The effects of photo-oxidative degradation of polyacids at various concentrations and with different durations of ultraviolet (UV) irradiation on the photo-reduction of ceria nanoparticles were investigated. The effect of UV-treated ceria on the performance of chemical mechanical polishing (CMP) for...

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Detalles Bibliográficos
Autores principales: Kim, Eungchul, Hong, Jiah, Seok, Hyunho, Kim, Taesung
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8803865/
https://www.ncbi.nlm.nih.gov/pubmed/35102147
http://dx.doi.org/10.1038/s41598-021-03866-9

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