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Photo-oxidative degradation of polyacids derived ceria nanoparticle modulation for chemical mechanical polishing
The effects of photo-oxidative degradation of polyacids at various concentrations and with different durations of ultraviolet (UV) irradiation on the photo-reduction of ceria nanoparticles were investigated. The effect of UV-treated ceria on the performance of chemical mechanical polishing (CMP) for...
Autores principales: | Kim, Eungchul, Hong, Jiah, Seok, Hyunho, Kim, Taesung |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8803865/ https://www.ncbi.nlm.nih.gov/pubmed/35102147 http://dx.doi.org/10.1038/s41598-021-03866-9 |
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