Cargando…

Author Correction: Mechanism understanding in cryo atomic layer etching of SiO(2) based upon C(4)F(8) physisorption

Detalles Bibliográficos
Autores principales:	Antoun, G., Tillocher, T., Lefaucheux, P., Faguet, J., Maekawa, K., Dussart, R.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group UK 2022
Materias:	Author Correction
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8807615/ https://www.ncbi.nlm.nih.gov/pubmed/35105938 http://dx.doi.org/10.1038/s41598-022-06291-8

Ejemplares similares

Mechanism understanding in cryo atomic layer etching of SiO(2) based upon C(4)F(8) physisorption
por: Antoun, G., et al.
Publicado: (2021)

Comparison between Bosch and STiGer Processes for Deep Silicon Etching
por: Tillocher, Thomas, et al.
Publicado: (2021)

Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above −50 °C
por: Chanson, R., et al.
Publicado: (2018)

Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene
por: Lukose, R., et al.
Publicado: (2021)

Conformal SiO(2) coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
por: Sobel, Nicolas, et al.
Publicado: (2015)

Physisorption kinetics
por: Kreuzer, Hans Jürgen, et al.
Publicado: (1986)

Author Correction: Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
por: Son, Jangyup, et al.
Publicado: (2018)

In Situ Study of the Wet Chemical Etching of SiO(2) and Nanoparticle@SiO(2) Core–Shell Nanospheres
por: Grau-Carbonell, Albert, et al.
Publicado: (2021)

Conical Nanotubes Synthesized by Atomic Layer Deposition of Al(2)O(3), TiO(2), and SiO(2) in Etched Ion-Track Nanochannels
por: Ulrich, Nils, et al.
Publicado: (2021)

Defect-Mediated Atomic Layer Etching Processes on Cl–Si(100): An Atomistic Insight
por: Wang, Peizhi, et al.
Publicado: (2023)

Systematic Study of the SiO(x) Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO(x)/SiO(2) Super-Lattice
por: Ma, Hong-Ping, et al.
Publicado: (2019)

Infinite Selectivity of Wet SiO(2) Etching in Respect to Al
por: Gablech, Imrich, et al.
Publicado: (2020)

Author Correction: Ultrafast probes of electron–hole transitions between two atomic layers
por: Wen, Xiewen, et al.
Publicado: (2018)

Author Correction: Cryo-EM structure of an active central apparatus
por: Han, Long, et al.
Publicado: (2023)

Author Correction: Understanding the effect of wet etching on damage resistance of surface scratches
por: Da Costa Fernandes, Benoit, et al.
Publicado: (2018)

Atomic characterization of Si nanoclusters embedded in SiO(2 )by atom probe tomography
por: Roussel, Manuel, et al.
Publicado: (2011)

Area-Selective Atomic Layer Deposition of ZnO on Si\SiO(2) Modified with Tris(dimethylamino)methylsilane
por: Moeini, Behnam, et al.
Publicado: (2023)

Characterization of SiO(2) Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas
por: Cho, Chulhee, et al.
Publicado: (2021)

Atomic-layer soft plasma etching of MoS(2)
por: Xiao, Shaoqing, et al.
Publicado: (2016)

Investigation into SiO(2) Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled
por: Jeong, Won-nyoung, et al.
Publicado: (2022)

Author Correction: A doping-less junction-formation mechanism between n-silicon and an atomically thin boron layer
por: Mohammadi, Vahid, et al.
Publicado: (2021)

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO(2) Using Carbon Dioxide
por: Zhu, Zhen, et al.
Publicado: (2019)

Atomic Layer Deposition for Preparing Isolated Co Sites on SiO(2) for Ethane Dehydrogenation Catalysis
por: Huang, Renjing, et al.
Publicado: (2020)

Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching
por: Gil-Santos, Eduardo, et al.
Publicado: (2018)

Author Correction: Cryo-EM reveals the structural basis of microtubule depolymerization by kinesin-13s
por: Benoit, Matthieu P. M. H., et al.
Publicado: (2018)

Author Correction: CryoEM structural exploration of catalytically active enzyme pyruvate carboxylase
por: López-Alonso, Jorge Pedro, et al.
Publicado: (2022)

Author Correction: Atomic layer deposited Pt-Ru dual-metal dimers and identifying their active sites for hydrogen evolution reaction
por: Zhang, Lei, et al.
Publicado: (2019)

Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices
por: Gerritsen, Sven H., et al.
Publicado: (2022)

Author Correction: High-resolution cryo-EM structure of urease from the pathogen Yersinia enterocolitica
por: Righetto, Ricardo D., et al.
Publicado: (2020)

Unravelling the physisorption characteristics of H(2)S molecule on biaxially strained single-layer MoS(2)
por: Tabatabaei, Seyed-Mohammad, et al.
Publicado: (2019)

Mechanistic Insight into Etching Chemistry and HF-Assisted Etching of MgO-Al(2)O(3)-SiO(2) Glass-Ceramic
por: Ji, Yanxin, et al.
Publicado: (2018)

Dynamics of Monolayer Physisorption in Homogeneous Mesoporous Media
por: Papatzacos, Paul
Publicado: (2019)

About the Dominance of Mesopores in Physisorption in Amorphous Materials
por: Strangfeld, Christoph, et al.
Publicado: (2021)

Author Correction: Isolated Rh atoms in dehydrogenation catalysis
por: Wittkämper, Haiko, et al.
Publicado: (2023)

Author Correction: Activation of subnanometric Pt on Cu-modified CeO(2) via redox-coupled atomic layer deposition for CO oxidation
por: Liu, Xiao, et al.
Publicado: (2020)

Fabrication of Diamond Submicron Lenses and Cylinders by ICP Etching Technique with SiO(2) Balls Mask
por: Liu, Zongchen, et al.
Publicado: (2019)

Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO(2)
por: Lee, Youngseok, et al.
Publicado: (2022)

Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
por: Kilic, Ufuk, et al.
Publicado: (2021)

SiO(2) thin film growth through a pure atomic layer deposition technique at room temperature
por: Arl, D., et al.
Publicado: (2020)

Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO(2) and TiO(2)
por: Arts, Karsten, et al.
Publicado: (2021)

Cannot write session to /tmp/vufind_sessions/sess_j43qthp1vcscc8fnn49hgjcsou