Cargando…
Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs
| Autores principales: | , , , , , , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer US
2022
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8821745/ https://www.ncbi.nlm.nih.gov/pubmed/35129724 http://dx.doi.org/10.1186/s11671-022-03664-w |
| _version_ | 1784646463739920384 |
|---|---|
| author | Yeh, Yen-Wei Lin, Su-Hui Hsu, Tsung-Chi Lai, Shouqiang Lee, Po-Tsung Lien, Shui-Yang Wuu, Dong-Sing Li, Guisen Chen, Zhong Wu, Tingzhu Kuo, Hao-Chung |
| author_facet | Yeh, Yen-Wei Lin, Su-Hui Hsu, Tsung-Chi Lai, Shouqiang Lee, Po-Tsung Lien, Shui-Yang Wuu, Dong-Sing Li, Guisen Chen, Zhong Wu, Tingzhu Kuo, Hao-Chung |
| author_sort | Yeh, Yen-Wei |
| collection | PubMed |
| description | |
| format | Online Article Text |
| id | pubmed-8821745 |
| institution | National Center for Biotechnology Information |
| language | English |
| publishDate | 2022 |
| publisher | Springer US |
| record_format | MEDLINE/PubMed |
| spelling | pubmed-88217452022-02-18 Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs Yeh, Yen-Wei Lin, Su-Hui Hsu, Tsung-Chi Lai, Shouqiang Lee, Po-Tsung Lien, Shui-Yang Wuu, Dong-Sing Li, Guisen Chen, Zhong Wu, Tingzhu Kuo, Hao-Chung Nanoscale Res Lett Correction Springer US 2022-02-07 /pmc/articles/PMC8821745/ /pubmed/35129724 http://dx.doi.org/10.1186/s11671-022-03664-w Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) . |
| spellingShingle | Correction Yeh, Yen-Wei Lin, Su-Hui Hsu, Tsung-Chi Lai, Shouqiang Lee, Po-Tsung Lien, Shui-Yang Wuu, Dong-Sing Li, Guisen Chen, Zhong Wu, Tingzhu Kuo, Hao-Chung Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title | Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_full | Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_fullStr | Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_full_unstemmed | Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_short | Correction: Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_sort | correction: advanced atomic layer deposition technologies for micro-leds and vcsels |
| topic | Correction |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8821745/ https://www.ncbi.nlm.nih.gov/pubmed/35129724 http://dx.doi.org/10.1186/s11671-022-03664-w |
| work_keys_str_mv | AT yehyenwei correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT linsuhui correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT hsutsungchi correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT laishouqiang correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT leepotsung correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT lienshuiyang correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT wuudongsing correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT liguisen correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT chenzhong correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT wutingzhu correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels AT kuohaochung correctionadvancedatomiclayerdepositiontechnologiesformicroledsandvcsels |