Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition

Crystal structure and electrical properties of hafnium-praseodymium oxide thin films grown by atomic layer deposition on ruthenium substrate electrodes were characterized and compared with those of undoped HfO(2) films. The HfO(2) reference films crystallized in the stable monoclinic phase of HfO(2)...

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Detalles Bibliográficos
Autores principales: Kukli, Kaupo, Aarik, Lauri, Vinuesa, Guillermo, Dueñas, Salvador, Castán, Helena, García, Héctor, Kasikov, Aarne, Ritslaid, Peeter, Piirsoo, Helle-Mai, Aarik, Jaan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8838690/
https://www.ncbi.nlm.nih.gov/pubmed/35160824
http://dx.doi.org/10.3390/ma15030877

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8838690/
https://www.ncbi.nlm.nih.gov/pubmed/35160824
http://dx.doi.org/10.3390/ma15030877

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