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Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation

[Image: see text] A detailed understanding of the growth of noble metals by atomic layer deposition (ALD) is key for various applications of these materials in catalysis and nanoelectronics. The Pt ALD process using MeCpPtMe(3) and O(2) gas as reactants serves as a model system for the ALD processes...

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Detalles Bibliográficos
Autores principales:	Vandalon, V., Mackus, A.J.M., Kessels, W.M.M.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	American Chemical Society 2022
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8842249/ https://www.ncbi.nlm.nih.gov/pubmed/35178137 http://dx.doi.org/10.1021/acs.jpcc.1c06947

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