Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy

Patterned elements of permalloy (Py) with a thickness as large as 300 nm have been defined by electron beam lithography on X-ray-transparent 50 nm thick membranes in order to characterize their magnetic structure via Magnetic Transmission X-ray Microscopy (MTXM). To avoid the situation where the fra...

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Detalles Bibliográficos
Autores principales: Hermosa, Javier, Hierro-Rodríguez, Aurelio, Quirós, Carlos, Vélez, María, Sorrentino, Andrea, Aballe, Lucía, Pereiro, Eva, Ferrer, Salvador, Martín, José I.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880630/
https://www.ncbi.nlm.nih.gov/pubmed/35208328
http://dx.doi.org/10.3390/mi13020204

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880630/
https://www.ncbi.nlm.nih.gov/pubmed/35208328
http://dx.doi.org/10.3390/mi13020204

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