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An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices

Though the complementary power field effect transistors (FETs), e.g., metal–oxide–semiconductor-FETs (MOSFETs) based on wide bandgap materials, enable low switching losses and on-resistance, p-channel FETs are not feasible in any wide bandgap material other than diamond. In this paper, we propose th...

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Autores principales: Alhasani, Reem, Yabe, Taichi, Iyama, Yutaro, Oi, Nobutaka, Imanishi, Shoichiro, Nguyen, Quang Ngoc, Kawarada, Hiroshi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8913839/
https://www.ncbi.nlm.nih.gov/pubmed/35273177
http://dx.doi.org/10.1038/s41598-022-05180-4
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author Alhasani, Reem
Yabe, Taichi
Iyama, Yutaro
Oi, Nobutaka
Imanishi, Shoichiro
Nguyen, Quang Ngoc
Kawarada, Hiroshi
author_facet Alhasani, Reem
Yabe, Taichi
Iyama, Yutaro
Oi, Nobutaka
Imanishi, Shoichiro
Nguyen, Quang Ngoc
Kawarada, Hiroshi
author_sort Alhasani, Reem
collection PubMed
description Though the complementary power field effect transistors (FETs), e.g., metal–oxide–semiconductor-FETs (MOSFETs) based on wide bandgap materials, enable low switching losses and on-resistance, p-channel FETs are not feasible in any wide bandgap material other than diamond. In this paper, we propose the first work to investigate the impact of fixed positive surface charge density on achieving normally-off and controlling threshold voltage operation obtained on p-channel two-dimensional hole gas (2DHG) hydrogen-terminated (C-H) diamond FET using nitrogen doping in the diamond substrate. In general, a p-channel diamond MOSFET demonstrates the normally-on operation, but the normally-off operation is also a critical requirement of the feasible electronic power devices in terms of safety operation. The characteristics of the C–H diamond MOSFET have been analyzed with the two demonstrated charge sheet models using the two-dimensional Silvaco Atlas TCAD. It shows that the fixed-Fermi level in the bulk diamond is 1.7 eV (donor level) from the conduction band minimum.  However, the upward band bending has been obtained at Al(2)O(3)/SiO(2)/C-H diamond interface indicating the presence of inversion layer without gate voltage. The fixed negative charge model exhibits a strong inversion layer for normally-on FET operation, while the fixed positive charge model shows a weak inversion for normally-off operation.  The maximum current density of a fixed positive interface charge model of the Al(2)O(3)/C-H diamond device is − 290 mA/mm, which corresponds to that of expermental result of Al(2)O(3)/SiO(2)/C-H diamond − 305 mA/mm at a gate-source voltage of − 40 V. Also, the threshold voltage V(th) is relatively high at V(th) = − 3.5 V, i.e., the positive charge model can reproduce the normally-off operation. Moreover, we also demonstrate that the V(th) and transconductance g(m ) correspond to those of the experimental work.
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spelling pubmed-89138392022-03-14 An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices Alhasani, Reem Yabe, Taichi Iyama, Yutaro Oi, Nobutaka Imanishi, Shoichiro Nguyen, Quang Ngoc Kawarada, Hiroshi Sci Rep Article Though the complementary power field effect transistors (FETs), e.g., metal–oxide–semiconductor-FETs (MOSFETs) based on wide bandgap materials, enable low switching losses and on-resistance, p-channel FETs are not feasible in any wide bandgap material other than diamond. In this paper, we propose the first work to investigate the impact of fixed positive surface charge density on achieving normally-off and controlling threshold voltage operation obtained on p-channel two-dimensional hole gas (2DHG) hydrogen-terminated (C-H) diamond FET using nitrogen doping in the diamond substrate. In general, a p-channel diamond MOSFET demonstrates the normally-on operation, but the normally-off operation is also a critical requirement of the feasible electronic power devices in terms of safety operation. The characteristics of the C–H diamond MOSFET have been analyzed with the two demonstrated charge sheet models using the two-dimensional Silvaco Atlas TCAD. It shows that the fixed-Fermi level in the bulk diamond is 1.7 eV (donor level) from the conduction band minimum.  However, the upward band bending has been obtained at Al(2)O(3)/SiO(2)/C-H diamond interface indicating the presence of inversion layer without gate voltage. The fixed negative charge model exhibits a strong inversion layer for normally-on FET operation, while the fixed positive charge model shows a weak inversion for normally-off operation.  The maximum current density of a fixed positive interface charge model of the Al(2)O(3)/C-H diamond device is − 290 mA/mm, which corresponds to that of expermental result of Al(2)O(3)/SiO(2)/C-H diamond − 305 mA/mm at a gate-source voltage of − 40 V. Also, the threshold voltage V(th) is relatively high at V(th) = − 3.5 V, i.e., the positive charge model can reproduce the normally-off operation. Moreover, we also demonstrate that the V(th) and transconductance g(m ) correspond to those of the experimental work. Nature Publishing Group UK 2022-03-10 /pmc/articles/PMC8913839/ /pubmed/35273177 http://dx.doi.org/10.1038/s41598-022-05180-4 Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Article
Alhasani, Reem
Yabe, Taichi
Iyama, Yutaro
Oi, Nobutaka
Imanishi, Shoichiro
Nguyen, Quang Ngoc
Kawarada, Hiroshi
An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices
title An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices
title_full An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices
title_fullStr An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices
title_full_unstemmed An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices
title_short An enhanced two-dimensional hole gas (2DHG) C–H diamond with positive surface charge model for advanced normally-off MOSFET devices
title_sort enhanced two-dimensional hole gas (2dhg) c–h diamond with positive surface charge model for advanced normally-off mosfet devices
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8913839/
https://www.ncbi.nlm.nih.gov/pubmed/35273177
http://dx.doi.org/10.1038/s41598-022-05180-4
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