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Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene

A key common problem for vertical few-layer graphene (VFLG) applications in electronic devices is the solution to grow on substrates. In this study, four kinds of substrates (silicon, stainless-steel, quartz and carbon-cloth) were examined to understand the mechanism of the nucleation and growth of...

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Autores principales: Hong, Tianzeng, Guo, Chan, Zhang, Yu, Zhan, Runze, Zhao, Peng, Li, Baohong, Deng, Shaozhi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8950384/
https://www.ncbi.nlm.nih.gov/pubmed/35335784
http://dx.doi.org/10.3390/nano12060971
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author Hong, Tianzeng
Guo, Chan
Zhang, Yu
Zhan, Runze
Zhao, Peng
Li, Baohong
Deng, Shaozhi
author_facet Hong, Tianzeng
Guo, Chan
Zhang, Yu
Zhan, Runze
Zhao, Peng
Li, Baohong
Deng, Shaozhi
author_sort Hong, Tianzeng
collection PubMed
description A key common problem for vertical few-layer graphene (VFLG) applications in electronic devices is the solution to grow on substrates. In this study, four kinds of substrates (silicon, stainless-steel, quartz and carbon-cloth) were examined to understand the mechanism of the nucleation and growth of VFLG by using the inductively-coupled plasma-enhanced chemical vapor deposition (ICPCVD) method. The theoretical and experimental results show that the initial nucleation of VFLG was influenced by the properties of the substrates. Surface energy and catalysis of substrates had a significant effect on controlling nucleation density and nucleation rate of VFLG at the initial growth stage. The quality of the VFLG sheet rarely had a relationship with this kind of substrate and was prone to being influenced by growth conditions. The characterization of conductivity and field emissions for a single VFLG were examined in order to understand the influence of substrates on the electrical property. The results showed that there was little difference in the conductivity of the VFLG sheet grown on the four substrates, while the interfacial contact resistance of VFLG on the four substrates showed a tremendous difference due to the different properties of said substrates. Therefore, the field emission characterization of the VFLG sheet grown on stainless-steel substrate was the best, with the maximum emission current of 35 µA at a 160 V/μm electrostatic field. This finding highlights the controllable interface of between VFLG and substrates as an important issue for electrical application.
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spelling pubmed-89503842022-03-26 Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene Hong, Tianzeng Guo, Chan Zhang, Yu Zhan, Runze Zhao, Peng Li, Baohong Deng, Shaozhi Nanomaterials (Basel) Article A key common problem for vertical few-layer graphene (VFLG) applications in electronic devices is the solution to grow on substrates. In this study, four kinds of substrates (silicon, stainless-steel, quartz and carbon-cloth) were examined to understand the mechanism of the nucleation and growth of VFLG by using the inductively-coupled plasma-enhanced chemical vapor deposition (ICPCVD) method. The theoretical and experimental results show that the initial nucleation of VFLG was influenced by the properties of the substrates. Surface energy and catalysis of substrates had a significant effect on controlling nucleation density and nucleation rate of VFLG at the initial growth stage. The quality of the VFLG sheet rarely had a relationship with this kind of substrate and was prone to being influenced by growth conditions. The characterization of conductivity and field emissions for a single VFLG were examined in order to understand the influence of substrates on the electrical property. The results showed that there was little difference in the conductivity of the VFLG sheet grown on the four substrates, while the interfacial contact resistance of VFLG on the four substrates showed a tremendous difference due to the different properties of said substrates. Therefore, the field emission characterization of the VFLG sheet grown on stainless-steel substrate was the best, with the maximum emission current of 35 µA at a 160 V/μm electrostatic field. This finding highlights the controllable interface of between VFLG and substrates as an important issue for electrical application. MDPI 2022-03-15 /pmc/articles/PMC8950384/ /pubmed/35335784 http://dx.doi.org/10.3390/nano12060971 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Hong, Tianzeng
Guo, Chan
Zhang, Yu
Zhan, Runze
Zhao, Peng
Li, Baohong
Deng, Shaozhi
Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene
title Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene
title_full Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene
title_fullStr Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene
title_full_unstemmed Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene
title_short Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene
title_sort effects of substrates on nucleation, growth and electrical property of vertical few-layer graphene
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8950384/
https://www.ncbi.nlm.nih.gov/pubmed/35335784
http://dx.doi.org/10.3390/nano12060971
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