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Silver Nanowires and Silanes in Hybrid Functionalization of Aramid Fabrics

New functionalization methods of meta- and para-aramid fabrics with silver nanowires (AgNWs) and two silanes (3-aminopropyltriethoxysilane (APTES)) and diethoxydimethylsilane (DEDMS) were developed: a one-step method (mixture) with AgNWs dispersed in the silane mixture and a two-step method (layer-b...

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Detalles Bibliográficos
Autores principales: Nejman, Alicja, Baranowska-Korczyc, Anna, Ranoszek-Soliwoda, Katarzyna, Jasińska, Izabela, Celichowski, Grzegorz, Cieślak, Małgorzata
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954008/
https://www.ncbi.nlm.nih.gov/pubmed/35335318
http://dx.doi.org/10.3390/molecules27061952
Descripción
Sumario:New functionalization methods of meta- and para-aramid fabrics with silver nanowires (AgNWs) and two silanes (3-aminopropyltriethoxysilane (APTES)) and diethoxydimethylsilane (DEDMS) were developed: a one-step method (mixture) with AgNWs dispersed in the silane mixture and a two-step method (layer-by-layer) in which the silanes mixture was applied to the previously deposited AgNWs layer. The fabrics were pre-treated in a low-pressure air radio frequency (RF) plasma and subsequently coated with polydopamine. The modified fabrics acquired hydrophobic properties (contact angle Θ(W) of 112–125°). The surface free energy for both modified fabrics was approximately 29 mJ/m(2), while for reference, meta- and para-aramid fabrics have a free energy of 53 mJ/m(2) and 40 mJ/m(2), respectively. The electrical surface resistance (R(s)) was on the order of 10(2) Ω and 10(4) Ω for the two-step and one-step method, respectively. The electrical volume resistance (R(v)) for both modified fabrics was on the order of 10(2) Ω. After UV irradiation, the Rs did not change for the two-step method, and for the one-step method, it increased to the order of 10(10) Ω. The specific strength values were higher by 71% and 63% for the meta-aramid fabric and by 102% and 110% for the para-aramid fabric for the two-step and one-step method, respectively, compared to the unmodified fabrics after UV radiation.