Cargando…

High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)

Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary interconnection industries and disruptive applications. Here, we demonstrated the design and fabrication of a high...

Descripción completa

Detalles Bibliográficos
Autores principales: Wu, Rongbo, Gao, Lang, Liang, Youting, Zheng, Yong, Zhou, Junxia, Qi, Hongxin, Yin, Difeng, Wang, Min, Fang, Zhiwei, Cheng, Ya
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954017/
https://www.ncbi.nlm.nih.gov/pubmed/35334670
http://dx.doi.org/10.3390/mi13030378
_version_ 1784675990567387136
author Wu, Rongbo
Gao, Lang
Liang, Youting
Zheng, Yong
Zhou, Junxia
Qi, Hongxin
Yin, Difeng
Wang, Min
Fang, Zhiwei
Cheng, Ya
author_facet Wu, Rongbo
Gao, Lang
Liang, Youting
Zheng, Yong
Zhou, Junxia
Qi, Hongxin
Yin, Difeng
Wang, Min
Fang, Zhiwei
Cheng, Ya
author_sort Wu, Rongbo
collection PubMed
description Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary interconnection industries and disruptive applications. Here, we demonstrated the design and fabrication of a high performance thin-film LN EO modulator using photolithography assisted chemo-mechanical etching (PLACE) technology. Our device shows a 3-dB bandwidth over 50 GHz, along with a comparable low half wave voltage-length product of 2.16 Vcm and a fiber-to-fiber insertion loss of 2.6 dB. The PLACE technology supports large footprint, high fabrication uniformity, competitive production rate and extreme low device optical loss simultaneously, our result shows promising potential for developing high-performance large-scale low-loss photonic integrated devices.
format Online
Article
Text
id pubmed-8954017
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-89540172022-03-26 High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) Wu, Rongbo Gao, Lang Liang, Youting Zheng, Yong Zhou, Junxia Qi, Hongxin Yin, Difeng Wang, Min Fang, Zhiwei Cheng, Ya Micromachines (Basel) Article Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary interconnection industries and disruptive applications. Here, we demonstrated the design and fabrication of a high performance thin-film LN EO modulator using photolithography assisted chemo-mechanical etching (PLACE) technology. Our device shows a 3-dB bandwidth over 50 GHz, along with a comparable low half wave voltage-length product of 2.16 Vcm and a fiber-to-fiber insertion loss of 2.6 dB. The PLACE technology supports large footprint, high fabrication uniformity, competitive production rate and extreme low device optical loss simultaneously, our result shows promising potential for developing high-performance large-scale low-loss photonic integrated devices. MDPI 2022-02-26 /pmc/articles/PMC8954017/ /pubmed/35334670 http://dx.doi.org/10.3390/mi13030378 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Wu, Rongbo
Gao, Lang
Liang, Youting
Zheng, Yong
Zhou, Junxia
Qi, Hongxin
Yin, Difeng
Wang, Min
Fang, Zhiwei
Cheng, Ya
High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
title High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
title_full High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
title_fullStr High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
title_full_unstemmed High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
title_short High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
title_sort high-production-rate fabrication of low-loss lithium niobate electro-optic modulators using photolithography assisted chemo-mechanical etching (place)
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954017/
https://www.ncbi.nlm.nih.gov/pubmed/35334670
http://dx.doi.org/10.3390/mi13030378
work_keys_str_mv AT wurongbo highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT gaolang highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT liangyouting highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT zhengyong highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT zhoujunxia highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT qihongxin highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT yindifeng highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT wangmin highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT fangzhiwei highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace
AT chengya highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace