Cargando…
High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary interconnection industries and disruptive applications. Here, we demonstrated the design and fabrication of a high...
Autores principales: | , , , , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954017/ https://www.ncbi.nlm.nih.gov/pubmed/35334670 http://dx.doi.org/10.3390/mi13030378 |
_version_ | 1784675990567387136 |
---|---|
author | Wu, Rongbo Gao, Lang Liang, Youting Zheng, Yong Zhou, Junxia Qi, Hongxin Yin, Difeng Wang, Min Fang, Zhiwei Cheng, Ya |
author_facet | Wu, Rongbo Gao, Lang Liang, Youting Zheng, Yong Zhou, Junxia Qi, Hongxin Yin, Difeng Wang, Min Fang, Zhiwei Cheng, Ya |
author_sort | Wu, Rongbo |
collection | PubMed |
description | Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary interconnection industries and disruptive applications. Here, we demonstrated the design and fabrication of a high performance thin-film LN EO modulator using photolithography assisted chemo-mechanical etching (PLACE) technology. Our device shows a 3-dB bandwidth over 50 GHz, along with a comparable low half wave voltage-length product of 2.16 Vcm and a fiber-to-fiber insertion loss of 2.6 dB. The PLACE technology supports large footprint, high fabrication uniformity, competitive production rate and extreme low device optical loss simultaneously, our result shows promising potential for developing high-performance large-scale low-loss photonic integrated devices. |
format | Online Article Text |
id | pubmed-8954017 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-89540172022-03-26 High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) Wu, Rongbo Gao, Lang Liang, Youting Zheng, Yong Zhou, Junxia Qi, Hongxin Yin, Difeng Wang, Min Fang, Zhiwei Cheng, Ya Micromachines (Basel) Article Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary interconnection industries and disruptive applications. Here, we demonstrated the design and fabrication of a high performance thin-film LN EO modulator using photolithography assisted chemo-mechanical etching (PLACE) technology. Our device shows a 3-dB bandwidth over 50 GHz, along with a comparable low half wave voltage-length product of 2.16 Vcm and a fiber-to-fiber insertion loss of 2.6 dB. The PLACE technology supports large footprint, high fabrication uniformity, competitive production rate and extreme low device optical loss simultaneously, our result shows promising potential for developing high-performance large-scale low-loss photonic integrated devices. MDPI 2022-02-26 /pmc/articles/PMC8954017/ /pubmed/35334670 http://dx.doi.org/10.3390/mi13030378 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Wu, Rongbo Gao, Lang Liang, Youting Zheng, Yong Zhou, Junxia Qi, Hongxin Yin, Difeng Wang, Min Fang, Zhiwei Cheng, Ya High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) |
title | High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) |
title_full | High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) |
title_fullStr | High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) |
title_full_unstemmed | High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) |
title_short | High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE) |
title_sort | high-production-rate fabrication of low-loss lithium niobate electro-optic modulators using photolithography assisted chemo-mechanical etching (place) |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954017/ https://www.ncbi.nlm.nih.gov/pubmed/35334670 http://dx.doi.org/10.3390/mi13030378 |
work_keys_str_mv | AT wurongbo highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT gaolang highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT liangyouting highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT zhengyong highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT zhoujunxia highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT qihongxin highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT yindifeng highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT wangmin highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT fangzhiwei highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace AT chengya highproductionratefabricationoflowlosslithiumniobateelectroopticmodulatorsusingphotolithographyassistedchemomechanicaletchingplace |