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Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes
Thin-film electrolyte made of 8-mol% yttria stabilized zirconia (8YSZ) for solid oxide fuel cells (SOFCs) was fabricated on anode substrates using reactive magnetron sputtering of Zr-Y targets in a mixture of Ar and O(2) gases. The deposition of 4–6 µm thin-film electrolyte was in the transition or...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954431/ https://www.ncbi.nlm.nih.gov/pubmed/35323820 http://dx.doi.org/10.3390/membranes12030346 |
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author | Solovyev, Andrey Rabotkin, Sergey Shipilova, Anna Agarkov, Dmitrii Burmistrov, Ilya Shmakov, Alexander |
author_facet | Solovyev, Andrey Rabotkin, Sergey Shipilova, Anna Agarkov, Dmitrii Burmistrov, Ilya Shmakov, Alexander |
author_sort | Solovyev, Andrey |
collection | PubMed |
description | Thin-film electrolyte made of 8-mol% yttria stabilized zirconia (8YSZ) for solid oxide fuel cells (SOFCs) was fabricated on anode substrates using reactive magnetron sputtering of Zr-Y targets in a mixture of Ar and O(2) gases. The deposition of 4–6 µm thin-film electrolyte was in the transition or oxide modes differing by the oxygen concentration in the sputtering atmosphere. The half-cell bending of the anode-supported SOFCs was measured to determine the residual stresses in the electrolyte films after the deposition and thermal annealing in air. The dependences were studied between the deposition modes, residual stresses in the films, and the SOFC performance. At 800 °C, the maximum power density of SOFCs ranged between 0.58 and 1.2 W/cm(2) depending on the electrolyte deposition mode. Scanning electron microscopy was carried out to investigate the surface morphology and structure of the YSZ electrolyte films after thermal annealing. Additionally, an X-ray diffraction analysis of the YSZ electrolyte films was conducted for the synchrotron radiation beam during thermal annealing at different temperatures up to 1300 °C. It was found that certain deposition modes provide the formation of the YSZ electrolyte films with acceptable residual stresses (<1 GPa) at room temperature, including films deposited on large area anodes (100 × 100 mm(2)). |
format | Online Article Text |
id | pubmed-8954431 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-89544312022-03-26 Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes Solovyev, Andrey Rabotkin, Sergey Shipilova, Anna Agarkov, Dmitrii Burmistrov, Ilya Shmakov, Alexander Membranes (Basel) Article Thin-film electrolyte made of 8-mol% yttria stabilized zirconia (8YSZ) for solid oxide fuel cells (SOFCs) was fabricated on anode substrates using reactive magnetron sputtering of Zr-Y targets in a mixture of Ar and O(2) gases. The deposition of 4–6 µm thin-film electrolyte was in the transition or oxide modes differing by the oxygen concentration in the sputtering atmosphere. The half-cell bending of the anode-supported SOFCs was measured to determine the residual stresses in the electrolyte films after the deposition and thermal annealing in air. The dependences were studied between the deposition modes, residual stresses in the films, and the SOFC performance. At 800 °C, the maximum power density of SOFCs ranged between 0.58 and 1.2 W/cm(2) depending on the electrolyte deposition mode. Scanning electron microscopy was carried out to investigate the surface morphology and structure of the YSZ electrolyte films after thermal annealing. Additionally, an X-ray diffraction analysis of the YSZ electrolyte films was conducted for the synchrotron radiation beam during thermal annealing at different temperatures up to 1300 °C. It was found that certain deposition modes provide the formation of the YSZ electrolyte films with acceptable residual stresses (<1 GPa) at room temperature, including films deposited on large area anodes (100 × 100 mm(2)). MDPI 2022-03-19 /pmc/articles/PMC8954431/ /pubmed/35323820 http://dx.doi.org/10.3390/membranes12030346 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Solovyev, Andrey Rabotkin, Sergey Shipilova, Anna Agarkov, Dmitrii Burmistrov, Ilya Shmakov, Alexander Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes |
title | Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes |
title_full | Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes |
title_fullStr | Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes |
title_full_unstemmed | Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes |
title_short | Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes |
title_sort | influence of deposition modes and thermal annealing on residual stresses in magnetron-sputtered ysz membranes |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954431/ https://www.ncbi.nlm.nih.gov/pubmed/35323820 http://dx.doi.org/10.3390/membranes12030346 |
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