Cargando…

Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes

Thin-film electrolyte made of 8-mol% yttria stabilized zirconia (8YSZ) for solid oxide fuel cells (SOFCs) was fabricated on anode substrates using reactive magnetron sputtering of Zr-Y targets in a mixture of Ar and O(2) gases. The deposition of 4–6 µm thin-film electrolyte was in the transition or...

Descripción completa

Detalles Bibliográficos
Autores principales: Solovyev, Andrey, Rabotkin, Sergey, Shipilova, Anna, Agarkov, Dmitrii, Burmistrov, Ilya, Shmakov, Alexander
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954431/
https://www.ncbi.nlm.nih.gov/pubmed/35323820
http://dx.doi.org/10.3390/membranes12030346
_version_ 1784676091641724928
author Solovyev, Andrey
Rabotkin, Sergey
Shipilova, Anna
Agarkov, Dmitrii
Burmistrov, Ilya
Shmakov, Alexander
author_facet Solovyev, Andrey
Rabotkin, Sergey
Shipilova, Anna
Agarkov, Dmitrii
Burmistrov, Ilya
Shmakov, Alexander
author_sort Solovyev, Andrey
collection PubMed
description Thin-film electrolyte made of 8-mol% yttria stabilized zirconia (8YSZ) for solid oxide fuel cells (SOFCs) was fabricated on anode substrates using reactive magnetron sputtering of Zr-Y targets in a mixture of Ar and O(2) gases. The deposition of 4–6 µm thin-film electrolyte was in the transition or oxide modes differing by the oxygen concentration in the sputtering atmosphere. The half-cell bending of the anode-supported SOFCs was measured to determine the residual stresses in the electrolyte films after the deposition and thermal annealing in air. The dependences were studied between the deposition modes, residual stresses in the films, and the SOFC performance. At 800 °C, the maximum power density of SOFCs ranged between 0.58 and 1.2 W/cm(2) depending on the electrolyte deposition mode. Scanning electron microscopy was carried out to investigate the surface morphology and structure of the YSZ electrolyte films after thermal annealing. Additionally, an X-ray diffraction analysis of the YSZ electrolyte films was conducted for the synchrotron radiation beam during thermal annealing at different temperatures up to 1300 °C. It was found that certain deposition modes provide the formation of the YSZ electrolyte films with acceptable residual stresses (<1 GPa) at room temperature, including films deposited on large area anodes (100 × 100 mm(2)).
format Online
Article
Text
id pubmed-8954431
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-89544312022-03-26 Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes Solovyev, Andrey Rabotkin, Sergey Shipilova, Anna Agarkov, Dmitrii Burmistrov, Ilya Shmakov, Alexander Membranes (Basel) Article Thin-film electrolyte made of 8-mol% yttria stabilized zirconia (8YSZ) for solid oxide fuel cells (SOFCs) was fabricated on anode substrates using reactive magnetron sputtering of Zr-Y targets in a mixture of Ar and O(2) gases. The deposition of 4–6 µm thin-film electrolyte was in the transition or oxide modes differing by the oxygen concentration in the sputtering atmosphere. The half-cell bending of the anode-supported SOFCs was measured to determine the residual stresses in the electrolyte films after the deposition and thermal annealing in air. The dependences were studied between the deposition modes, residual stresses in the films, and the SOFC performance. At 800 °C, the maximum power density of SOFCs ranged between 0.58 and 1.2 W/cm(2) depending on the electrolyte deposition mode. Scanning electron microscopy was carried out to investigate the surface morphology and structure of the YSZ electrolyte films after thermal annealing. Additionally, an X-ray diffraction analysis of the YSZ electrolyte films was conducted for the synchrotron radiation beam during thermal annealing at different temperatures up to 1300 °C. It was found that certain deposition modes provide the formation of the YSZ electrolyte films with acceptable residual stresses (<1 GPa) at room temperature, including films deposited on large area anodes (100 × 100 mm(2)). MDPI 2022-03-19 /pmc/articles/PMC8954431/ /pubmed/35323820 http://dx.doi.org/10.3390/membranes12030346 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Solovyev, Andrey
Rabotkin, Sergey
Shipilova, Anna
Agarkov, Dmitrii
Burmistrov, Ilya
Shmakov, Alexander
Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes
title Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes
title_full Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes
title_fullStr Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes
title_full_unstemmed Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes
title_short Influence of Deposition Modes and Thermal Annealing on Residual Stresses in Magnetron-Sputtered YSZ Membranes
title_sort influence of deposition modes and thermal annealing on residual stresses in magnetron-sputtered ysz membranes
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954431/
https://www.ncbi.nlm.nih.gov/pubmed/35323820
http://dx.doi.org/10.3390/membranes12030346
work_keys_str_mv AT solovyevandrey influenceofdepositionmodesandthermalannealingonresidualstressesinmagnetronsputteredyszmembranes
AT rabotkinsergey influenceofdepositionmodesandthermalannealingonresidualstressesinmagnetronsputteredyszmembranes
AT shipilovaanna influenceofdepositionmodesandthermalannealingonresidualstressesinmagnetronsputteredyszmembranes
AT agarkovdmitrii influenceofdepositionmodesandthermalannealingonresidualstressesinmagnetronsputteredyszmembranes
AT burmistrovilya influenceofdepositionmodesandthermalannealingonresidualstressesinmagnetronsputteredyszmembranes
AT shmakovalexander influenceofdepositionmodesandthermalannealingonresidualstressesinmagnetronsputteredyszmembranes