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Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures

In this paper, tungsten oxide (WO(3)) is deposited on a silicon substrate applied in electrolyte-insulator-semiconductor structures for pH sensing devices. To boost the sensing performance, yttrium (Y) is doped into WO(3) membranes, and annealing is incorporated in the fabrication process. To invest...

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Autores principales: Kao, Chyuan-Haur, Liao, Yu-Ching, Chuang, Chi-Chih, Huang, Yi-Hsuan, Lee, Chang-Hsueh, Chen, Shih-Ming, Lee, Ming-Ling, Chen, Hsiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954489/
https://www.ncbi.nlm.nih.gov/pubmed/35323803
http://dx.doi.org/10.3390/membranes12030328
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author Kao, Chyuan-Haur
Liao, Yu-Ching
Chuang, Chi-Chih
Huang, Yi-Hsuan
Lee, Chang-Hsueh
Chen, Shih-Ming
Lee, Ming-Ling
Chen, Hsiang
author_facet Kao, Chyuan-Haur
Liao, Yu-Ching
Chuang, Chi-Chih
Huang, Yi-Hsuan
Lee, Chang-Hsueh
Chen, Shih-Ming
Lee, Ming-Ling
Chen, Hsiang
author_sort Kao, Chyuan-Haur
collection PubMed
description In this paper, tungsten oxide (WO(3)) is deposited on a silicon substrate applied in electrolyte-insulator-semiconductor structures for pH sensing devices. To boost the sensing performance, yttrium (Y) is doped into WO(3) membranes, and annealing is incorporated in the fabrication process. To investigate the effects of Y doping and annealing, multiple material characterizations including X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atom force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM) are performed. Material analysis results indicate that annealing and Y doping can increase crystallinity, suppress defects, and enhance grainization, thereby strengthening membrane sensing capabilities in terms of sensitivity, linearity, and reliability. Because of their stable response, high reliability, and compact size, Y-doped WO(3) membranes are promising for future biomedical applications.
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spelling pubmed-89544892022-03-26 Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures Kao, Chyuan-Haur Liao, Yu-Ching Chuang, Chi-Chih Huang, Yi-Hsuan Lee, Chang-Hsueh Chen, Shih-Ming Lee, Ming-Ling Chen, Hsiang Membranes (Basel) Article In this paper, tungsten oxide (WO(3)) is deposited on a silicon substrate applied in electrolyte-insulator-semiconductor structures for pH sensing devices. To boost the sensing performance, yttrium (Y) is doped into WO(3) membranes, and annealing is incorporated in the fabrication process. To investigate the effects of Y doping and annealing, multiple material characterizations including X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atom force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM) are performed. Material analysis results indicate that annealing and Y doping can increase crystallinity, suppress defects, and enhance grainization, thereby strengthening membrane sensing capabilities in terms of sensitivity, linearity, and reliability. Because of their stable response, high reliability, and compact size, Y-doped WO(3) membranes are promising for future biomedical applications. MDPI 2022-03-15 /pmc/articles/PMC8954489/ /pubmed/35323803 http://dx.doi.org/10.3390/membranes12030328 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Kao, Chyuan-Haur
Liao, Yu-Ching
Chuang, Chi-Chih
Huang, Yi-Hsuan
Lee, Chang-Hsueh
Chen, Shih-Ming
Lee, Ming-Ling
Chen, Hsiang
Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures
title Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures
title_full Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures
title_fullStr Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures
title_full_unstemmed Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures
title_short Influence of Y Doping on WO(3) Membranes Applied in Electrolyte-Insulator-Semiconductor Structures
title_sort influence of y doping on wo(3) membranes applied in electrolyte-insulator-semiconductor structures
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8954489/
https://www.ncbi.nlm.nih.gov/pubmed/35323803
http://dx.doi.org/10.3390/membranes12030328
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