Non-invasive digital etching of van der Waals semiconductors

The capability to finely tailor material thickness with simultaneous atomic precision and non-invasivity would be useful for constructing quantum platforms and post-Moore microelectronics. However, it remains challenging to attain synchronized controls over tailoring selectivity and precision. Here...

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Detalles Bibliográficos
Autores principales: Zhou, Jian, Zhang, Chunchen, Shi, Li, Chen, Xiaoqing, Kim, Tae Soo, Gyeon, Minseung, Chen, Jian, Wang, Jinlan, Yu, Linwei, Wang, Xinran, Kang, Kibum, Orgiu, Emanuele, Samorì, Paolo, Watanabe, Kenji, Taniguchi, Takashi, Tsukagoshi, Kazuhito, Wang, Peng, Shi, Yi, Li, Songlin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8983769/
https://www.ncbi.nlm.nih.gov/pubmed/35383178
http://dx.doi.org/10.1038/s41467-022-29447-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8983769/
https://www.ncbi.nlm.nih.gov/pubmed/35383178
http://dx.doi.org/10.1038/s41467-022-29447-6

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