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Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications

For the first time, nanofluid boiling was applied as a process for the creation of a semiconductor TiO(2) nanoparticle film that can be deposited onto a conductive substrate (F-doped SnO(2) glass: FTO). A steel-base device designed for pool boiling was used to deposit a TiO(2)-based nanofluid consis...

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Autores principales: Vafaei, Saeid, Holmes, Ian, Errion, Benjamin, Thukka, Zigmey, Narita, Ryoki, Sugiura, Takashi, Manseki, Kazuhiro
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9000513/
https://www.ncbi.nlm.nih.gov/pubmed/35407284
http://dx.doi.org/10.3390/nano12071165
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author Vafaei, Saeid
Holmes, Ian
Errion, Benjamin
Thukka, Zigmey
Narita, Ryoki
Sugiura, Takashi
Manseki, Kazuhiro
author_facet Vafaei, Saeid
Holmes, Ian
Errion, Benjamin
Thukka, Zigmey
Narita, Ryoki
Sugiura, Takashi
Manseki, Kazuhiro
author_sort Vafaei, Saeid
collection PubMed
description For the first time, nanofluid boiling was applied as a process for the creation of a semiconductor TiO(2) nanoparticle film that can be deposited onto a conductive substrate (F-doped SnO(2) glass: FTO). A steel-base device designed for pool boiling was used to deposit a TiO(2)-based nanofluid consisting of nanoparticles with an average size of about 20 nm. The boiling of the nanofluid directly on the FTO glass substrate allowed for the deposition of the nanoparticles onto the FTO surface. In principle, the surface responsible for transferring heat to the fluid can be covered with these nanoparticles when the nanofluid boils. Using the as-deposited films, crystal growth of the TiO(2) nanoparticle was controlled by varying the strategies of the post-sintering profile. The maximum temperatures, periods, and ramping rates for the obtained samples were systematically changed. Scanning electron microscopy (SEM) revealed that a densely packed TiO(2)-nanoparticle layer was obtained for the as-deposited substrate via pool boiling. For the maximum temperature at 550 °C, the TiO(2) grain sizes became larger (~50 nm) and more round-shaped TiO(2) nanostructures were identified. Notably, we have demonstrated for the first time how the sintering of TiO(2) nanoparticles proceeds for the nanoporous TiO(2) films using high-resolution transmission electron microscopy (TEM) measurements. We found that the TiO(2) nanoparticles fused with each other and crystal growth occurred through neighboring 2–4 nanoparticles for the 550 °C sample, which was proved by the TEM analysis that continuous lattice fringes corresponding to the (101) anatase phase were clearly observed through the entire area of some nanoparticles aligned horizontally. In addition, the loss of the TiO(2) nanofluid (precursor solution) was completely avoided in our TiO(2) deposition. Unlike the commonly used spin-coating method, nanofluid pool boiling would provide an alternative cost-effective approach to manufacture semiconductor layers for various applications, such as solar cells.
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spelling pubmed-90005132022-04-12 Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications Vafaei, Saeid Holmes, Ian Errion, Benjamin Thukka, Zigmey Narita, Ryoki Sugiura, Takashi Manseki, Kazuhiro Nanomaterials (Basel) Article For the first time, nanofluid boiling was applied as a process for the creation of a semiconductor TiO(2) nanoparticle film that can be deposited onto a conductive substrate (F-doped SnO(2) glass: FTO). A steel-base device designed for pool boiling was used to deposit a TiO(2)-based nanofluid consisting of nanoparticles with an average size of about 20 nm. The boiling of the nanofluid directly on the FTO glass substrate allowed for the deposition of the nanoparticles onto the FTO surface. In principle, the surface responsible for transferring heat to the fluid can be covered with these nanoparticles when the nanofluid boils. Using the as-deposited films, crystal growth of the TiO(2) nanoparticle was controlled by varying the strategies of the post-sintering profile. The maximum temperatures, periods, and ramping rates for the obtained samples were systematically changed. Scanning electron microscopy (SEM) revealed that a densely packed TiO(2)-nanoparticle layer was obtained for the as-deposited substrate via pool boiling. For the maximum temperature at 550 °C, the TiO(2) grain sizes became larger (~50 nm) and more round-shaped TiO(2) nanostructures were identified. Notably, we have demonstrated for the first time how the sintering of TiO(2) nanoparticles proceeds for the nanoporous TiO(2) films using high-resolution transmission electron microscopy (TEM) measurements. We found that the TiO(2) nanoparticles fused with each other and crystal growth occurred through neighboring 2–4 nanoparticles for the 550 °C sample, which was proved by the TEM analysis that continuous lattice fringes corresponding to the (101) anatase phase were clearly observed through the entire area of some nanoparticles aligned horizontally. In addition, the loss of the TiO(2) nanofluid (precursor solution) was completely avoided in our TiO(2) deposition. Unlike the commonly used spin-coating method, nanofluid pool boiling would provide an alternative cost-effective approach to manufacture semiconductor layers for various applications, such as solar cells. MDPI 2022-03-31 /pmc/articles/PMC9000513/ /pubmed/35407284 http://dx.doi.org/10.3390/nano12071165 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Vafaei, Saeid
Holmes, Ian
Errion, Benjamin
Thukka, Zigmey
Narita, Ryoki
Sugiura, Takashi
Manseki, Kazuhiro
Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications
title Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications
title_full Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications
title_fullStr Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications
title_full_unstemmed Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications
title_short Manufacturing a TiO(2)-Based Semiconductor Film with Nanofluid Pool Boiling and Sintering Processes toward Solar-Cell Applications
title_sort manufacturing a tio(2)-based semiconductor film with nanofluid pool boiling and sintering processes toward solar-cell applications
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9000513/
https://www.ncbi.nlm.nih.gov/pubmed/35407284
http://dx.doi.org/10.3390/nano12071165
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