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Silicon surface patterning via galvanic microcontact imprinting lithography
Surface patterning without requiring expensive facilities and complex procedures is a major scientific and technological challenge. We report a simple surface patterning strategy on a silicon wafer surface. This strategy, termed galvanic microcontact imprinting lithography (GMIL), is based on the sp...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9034184/ https://www.ncbi.nlm.nih.gov/pubmed/35480843 http://dx.doi.org/10.1039/d1ra02459k |
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author | Zhang, Fuqiang Fu, Haoxin Peng, Kui-Qing |
author_facet | Zhang, Fuqiang Fu, Haoxin Peng, Kui-Qing |
author_sort | Zhang, Fuqiang |
collection | PubMed |
description | Surface patterning without requiring expensive facilities and complex procedures is a major scientific and technological challenge. We report a simple surface patterning strategy on a silicon wafer surface. This strategy, termed galvanic microcontact imprinting lithography (GMIL), is based on the spontaneous galvanic oxidation of silicon due to the electrically coupled silicon/gold mold with lithographically defined patterns. The galvanic induced silicon oxide pattern can be selectively removed in dilute HF solution or serve as a robust etchant resist in alkaline solution, enabling the formation of regular silicon microstructures on the silicon surface, affording an accessible, simple and cheap surface patterning method with no requirement of expensive and sophisticated instrumentation and facilities. These results may open exciting prospects for next-generation low-cost lithographic techniques. |
format | Online Article Text |
id | pubmed-9034184 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | The Royal Society of Chemistry |
record_format | MEDLINE/PubMed |
spelling | pubmed-90341842022-04-26 Silicon surface patterning via galvanic microcontact imprinting lithography Zhang, Fuqiang Fu, Haoxin Peng, Kui-Qing RSC Adv Chemistry Surface patterning without requiring expensive facilities and complex procedures is a major scientific and technological challenge. We report a simple surface patterning strategy on a silicon wafer surface. This strategy, termed galvanic microcontact imprinting lithography (GMIL), is based on the spontaneous galvanic oxidation of silicon due to the electrically coupled silicon/gold mold with lithographically defined patterns. The galvanic induced silicon oxide pattern can be selectively removed in dilute HF solution or serve as a robust etchant resist in alkaline solution, enabling the formation of regular silicon microstructures on the silicon surface, affording an accessible, simple and cheap surface patterning method with no requirement of expensive and sophisticated instrumentation and facilities. These results may open exciting prospects for next-generation low-cost lithographic techniques. The Royal Society of Chemistry 2021-06-25 /pmc/articles/PMC9034184/ /pubmed/35480843 http://dx.doi.org/10.1039/d1ra02459k Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/ |
spellingShingle | Chemistry Zhang, Fuqiang Fu, Haoxin Peng, Kui-Qing Silicon surface patterning via galvanic microcontact imprinting lithography |
title | Silicon surface patterning via galvanic microcontact imprinting lithography |
title_full | Silicon surface patterning via galvanic microcontact imprinting lithography |
title_fullStr | Silicon surface patterning via galvanic microcontact imprinting lithography |
title_full_unstemmed | Silicon surface patterning via galvanic microcontact imprinting lithography |
title_short | Silicon surface patterning via galvanic microcontact imprinting lithography |
title_sort | silicon surface patterning via galvanic microcontact imprinting lithography |
topic | Chemistry |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9034184/ https://www.ncbi.nlm.nih.gov/pubmed/35480843 http://dx.doi.org/10.1039/d1ra02459k |
work_keys_str_mv | AT zhangfuqiang siliconsurfacepatterningviagalvanicmicrocontactimprintinglithography AT fuhaoxin siliconsurfacepatterningviagalvanicmicrocontactimprintinglithography AT pengkuiqing siliconsurfacepatterningviagalvanicmicrocontactimprintinglithography |