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Self-catalyst β-Ga(2)O(3) semiconductor lateral nanowire networks synthesis on the insulating substrate for deep ultraviolet photodetectors

Monoclinic gallium oxide (β-Ga(2)O(3)) is a super-wide bandgap semiconductor with excellent chemical and thermal stability, which is an ideal candidate for detecting deep ultraviolet (DUV) radiation (100–280 nm). The growth of β-Ga(2)O(3) is challenging and most methods require Au as the catalyst an...

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Detalles Bibliográficos
Autores principales: Wu, Yutong, Feng, Shuanglong, Zhang, Miaomiao, Kang, Shuai, Zhang, Kun, Tao, Zhiyong, Fan, Yaxian, Lu, Wenqiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9038025/
https://www.ncbi.nlm.nih.gov/pubmed/35480721
http://dx.doi.org/10.1039/d1ra04663b
Descripción
Sumario:Monoclinic gallium oxide (β-Ga(2)O(3)) is a super-wide bandgap semiconductor with excellent chemical and thermal stability, which is an ideal candidate for detecting deep ultraviolet (DUV) radiation (100–280 nm). The growth of β-Ga(2)O(3) is challenging and most methods require Au as the catalyst and a long reacting time (more than 1 hour). In this work, the self-catalyst β-Ga(2)O(3) lateral nanowire networks were synthesized on an insulating substrate rapidly by a simple low-cost Chemical Vapor Deposition (CVD) method. A thin film of β-Ga(2)O(3) nanowire networks was synthesized within a reacting time of 15 minutes, which possesses a huge possibility for the rapid growth of β-Ga(2)O(3) metal oxide nanowires networks and application in the future solar-blind photodetector. MSM (metal–semiconductor–metal) photodetectors based on the β-Ga(2)O(3) nanowire networks revealed fast response (on–off ratios is about 10(3)), which is attributed to the unique cross-junction barrier-dominated conductance of the nanowire networks. In addition, the self-catalyst β-Ga(2)O(3) nanowires grown on insulating SiO(2) are achieved and could be expected to find important applications in a bottom-up way of fabricating the next generation semiconductor nanoelectronics.