Cargando…
Review of recent advances in inorganic photoresists
The semiconductor industry has witnessed a continuous decrease in the size of logic, memory and other computer chip components since its birth over half a century ago. The shrinking of features has to a large extent been enabled by the development of advanced photolithographic techniques. This revie...
Autores principales: | Luo, Chaoyun, Xu, Chanchan, Lv, Le, Li, Hai, Huang, Xiaoxi, Liu, Wei |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9049984/ https://www.ncbi.nlm.nih.gov/pubmed/35497823 http://dx.doi.org/10.1039/c9ra08977b |
Ejemplares similares
-
Quantum dot photolithography using a quantum dot photoresist composed of an organic–inorganic hybrid coating layer
por: Myeong, Seungmin, et al.
Publicado: (2022) -
Negative-tone molecular glass photoresist for high-resolution electron beam lithography
por: Wang, Yafei, et al.
Publicado: (2021) -
Photoresistance Switching of Plasmonic Nanopores
por: Li, Yi, et al.
Publicado: (2014) -
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
por: Rohdenburg, Markus, et al.
Publicado: (2021) -
MoS(2) memristor with photoresistive switching
por: Wang, Wei, et al.
Publicado: (2016)