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Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide

Laser direct writing is an attractive method for patterning 2D materials without contamination. Literature shows that the ultrafast ablation threshold of graphene across substrates varies by an order of magnitude. Some attribute it to the thermal coupling to the substrates, but it remains by and lar...

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Autores principales: Solomon, Joel M., Ahmad, Sabeeh Irfan, Dave, Arpit, Lu, Li-Syuan, HadavandMirzaee, Fatemeh, Lin, Shih-Chu, Chen, Sih-Hua, Luo, Chih-Wei, Chang, Wen-Hao, Her, Tsing-Hua
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9050692/
https://www.ncbi.nlm.nih.gov/pubmed/35484187
http://dx.doi.org/10.1038/s41598-022-10820-w
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author Solomon, Joel M.
Ahmad, Sabeeh Irfan
Dave, Arpit
Lu, Li-Syuan
HadavandMirzaee, Fatemeh
Lin, Shih-Chu
Chen, Sih-Hua
Luo, Chih-Wei
Chang, Wen-Hao
Her, Tsing-Hua
author_facet Solomon, Joel M.
Ahmad, Sabeeh Irfan
Dave, Arpit
Lu, Li-Syuan
HadavandMirzaee, Fatemeh
Lin, Shih-Chu
Chen, Sih-Hua
Luo, Chih-Wei
Chang, Wen-Hao
Her, Tsing-Hua
author_sort Solomon, Joel M.
collection PubMed
description Laser direct writing is an attractive method for patterning 2D materials without contamination. Literature shows that the ultrafast ablation threshold of graphene across substrates varies by an order of magnitude. Some attribute it to the thermal coupling to the substrates, but it remains by and large an open question. For the first time the effect of substrates on the femtosecond ablation of 2D materials is studied using MoS(2) as an example. We show unambiguously that femtosecond ablation of MoS(2) is an adiabatic process with negligible heat transfer to the substrates. The observed threshold variation is due to the etalon effect which was not identified before for the laser ablation of 2D materials. Subsequently, an intrinsic ablation threshold is proposed as a true threshold parameter for 2D materials. Additionally, we demonstrate for the first time femtosecond laser patterning of monolayer MoS(2) with sub-micron resolution and mm/s speed. Moreover, engineered substrates are shown to enhance the ablation efficiency, enabling patterning with low-power ultrafast oscillators. Finally, a zero-thickness approximation is introduced to predict the field enhancement with simple analytical expressions. Our work clarifies the role of substrates on ablation and firmly establishes ultrafast laser ablation as a viable route to pattern 2D materials.
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spelling pubmed-90506922022-04-30 Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide Solomon, Joel M. Ahmad, Sabeeh Irfan Dave, Arpit Lu, Li-Syuan HadavandMirzaee, Fatemeh Lin, Shih-Chu Chen, Sih-Hua Luo, Chih-Wei Chang, Wen-Hao Her, Tsing-Hua Sci Rep Article Laser direct writing is an attractive method for patterning 2D materials without contamination. Literature shows that the ultrafast ablation threshold of graphene across substrates varies by an order of magnitude. Some attribute it to the thermal coupling to the substrates, but it remains by and large an open question. For the first time the effect of substrates on the femtosecond ablation of 2D materials is studied using MoS(2) as an example. We show unambiguously that femtosecond ablation of MoS(2) is an adiabatic process with negligible heat transfer to the substrates. The observed threshold variation is due to the etalon effect which was not identified before for the laser ablation of 2D materials. Subsequently, an intrinsic ablation threshold is proposed as a true threshold parameter for 2D materials. Additionally, we demonstrate for the first time femtosecond laser patterning of monolayer MoS(2) with sub-micron resolution and mm/s speed. Moreover, engineered substrates are shown to enhance the ablation efficiency, enabling patterning with low-power ultrafast oscillators. Finally, a zero-thickness approximation is introduced to predict the field enhancement with simple analytical expressions. Our work clarifies the role of substrates on ablation and firmly establishes ultrafast laser ablation as a viable route to pattern 2D materials. Nature Publishing Group UK 2022-04-28 /pmc/articles/PMC9050692/ /pubmed/35484187 http://dx.doi.org/10.1038/s41598-022-10820-w Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Article
Solomon, Joel M.
Ahmad, Sabeeh Irfan
Dave, Arpit
Lu, Li-Syuan
HadavandMirzaee, Fatemeh
Lin, Shih-Chu
Chen, Sih-Hua
Luo, Chih-Wei
Chang, Wen-Hao
Her, Tsing-Hua
Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide
title Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide
title_full Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide
title_fullStr Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide
title_full_unstemmed Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide
title_short Ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide
title_sort ultrafast laser ablation, intrinsic threshold, and nanopatterning of monolayer molybdenum disulfide
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9050692/
https://www.ncbi.nlm.nih.gov/pubmed/35484187
http://dx.doi.org/10.1038/s41598-022-10820-w
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