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Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode

Detalles Bibliográficos
Autores principales: Chang, Hongliang, Liu, Zhetong, Yang, Shenyuan, Gao, Yaqi, Shan, Jingyuan, Liu, Bingyao, Sun, Jingyu, Chen, Zhaolong, Yan, Jianchang, Liu, Zhiqiang, Wang, Junxi, Gao, Peng, Li, Jinmin, Liu, Zhongfan, Wei, Tongbo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9054817/
https://www.ncbi.nlm.nih.gov/pubmed/35487891
http://dx.doi.org/10.1038/s41377-022-00802-y
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author Chang, Hongliang
Liu, Zhetong
Yang, Shenyuan
Gao, Yaqi
Shan, Jingyuan
Liu, Bingyao
Sun, Jingyu
Chen, Zhaolong
Yan, Jianchang
Liu, Zhiqiang
Wang, Junxi
Gao, Peng
Li, Jinmin
Liu, Zhongfan
Wei, Tongbo
author_facet Chang, Hongliang
Liu, Zhetong
Yang, Shenyuan
Gao, Yaqi
Shan, Jingyuan
Liu, Bingyao
Sun, Jingyu
Chen, Zhaolong
Yan, Jianchang
Liu, Zhiqiang
Wang, Junxi
Gao, Peng
Li, Jinmin
Liu, Zhongfan
Wei, Tongbo
author_sort Chang, Hongliang
collection PubMed
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spelling pubmed-90548172022-05-01 Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode Chang, Hongliang Liu, Zhetong Yang, Shenyuan Gao, Yaqi Shan, Jingyuan Liu, Bingyao Sun, Jingyu Chen, Zhaolong Yan, Jianchang Liu, Zhiqiang Wang, Junxi Gao, Peng Li, Jinmin Liu, Zhongfan Wei, Tongbo Light Sci Appl Author Correction Nature Publishing Group UK 2022-04-29 /pmc/articles/PMC9054817/ /pubmed/35487891 http://dx.doi.org/10.1038/s41377-022-00802-y Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Author Correction
Chang, Hongliang
Liu, Zhetong
Yang, Shenyuan
Gao, Yaqi
Shan, Jingyuan
Liu, Bingyao
Sun, Jingyu
Chen, Zhaolong
Yan, Jianchang
Liu, Zhiqiang
Wang, Junxi
Gao, Peng
Li, Jinmin
Liu, Zhongfan
Wei, Tongbo
Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode
title Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode
title_full Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode
title_fullStr Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode
title_full_unstemmed Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode
title_short Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode
title_sort author correction: graphene-driving strain engineering to enable strain-free epitaxy of aln film for deep ultraviolet light-emitting diode
topic Author Correction
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9054817/
https://www.ncbi.nlm.nih.gov/pubmed/35487891
http://dx.doi.org/10.1038/s41377-022-00802-y
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