Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films

In this work, we have studied the role varying nitrogen plasma compositions play in the low-temperature plasma-assisted growth of indium nitride (InN) thin films. Films were deposited on Si (100) substrates using a plasma-enhanced atomic layer deposition (PE-ALD) reactor featuring a capacitively-cou...

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Detalles Bibliográficos
Autores principales: Ilhom, Saidjafarzoda, Mohammad, Adnan, Shukla, Deepa, Grasso, John, Willis, Brian G., Okyay, Ali K., Biyikli, Necmi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2020
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9055617/
https://www.ncbi.nlm.nih.gov/pubmed/35516968
http://dx.doi.org/10.1039/d0ra04567e

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9055617/
https://www.ncbi.nlm.nih.gov/pubmed/35516968
http://dx.doi.org/10.1039/d0ra04567e

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