Cargando…
Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films
In this work, we have studied the role varying nitrogen plasma compositions play in the low-temperature plasma-assisted growth of indium nitride (InN) thin films. Films were deposited on Si (100) substrates using a plasma-enhanced atomic layer deposition (PE-ALD) reactor featuring a capacitively-cou...
| Autores principales: | , , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2020
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9055617/ https://www.ncbi.nlm.nih.gov/pubmed/35516968 http://dx.doi.org/10.1039/d0ra04567e |