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Versatile vapor phase deposition approach to cesium tin bromide materials CsSnBr(3), CsSn(2)Br(5) and Cs(2)SnBr(6)

We report on the successful application of RF-magnetron sputtering to deposit, by using a single type of target, three different materials in the form of thin films within the Cs–Sn–Br compositional range, namely, CsSnBr(3), CsSn(2)Br(5) and Cs(2)SnBr(6). It is shown that, by playing with the deposi...

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Detalles Bibliográficos
Autores principales: Bonomi, Sara, Patrini, Maddalena, Bongiovanni, Giovanni, Malavasi, Lorenzo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9055831/
https://www.ncbi.nlm.nih.gov/pubmed/35520057
http://dx.doi.org/10.1039/d0ra04680a
Descripción
Sumario:We report on the successful application of RF-magnetron sputtering to deposit, by using a single type of target, three different materials in the form of thin films within the Cs–Sn–Br compositional range, namely, CsSnBr(3), CsSn(2)Br(5) and Cs(2)SnBr(6). It is shown that, by playing with the deposition parameters and post-deposition treatments, it is possible to stabilize these three perovskites or perovskite related compounds by exploiting the versatility of vapor phase deposition. Full characterization in terms of crystal structure, optical properties and morphology is reported. The power of vapor phase methods in growing all-inorganic materials of interest for photovoltaic and optoelectronic applications is demonstrated here, indicating the advantageous use of sputtering for these complex materials.