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Versatile vapor phase deposition approach to cesium tin bromide materials CsSnBr(3), CsSn(2)Br(5) and Cs(2)SnBr(6)

We report on the successful application of RF-magnetron sputtering to deposit, by using a single type of target, three different materials in the form of thin films within the Cs–Sn–Br compositional range, namely, CsSnBr(3), CsSn(2)Br(5) and Cs(2)SnBr(6). It is shown that, by playing with the deposi...

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Detalles Bibliográficos
Autores principales:	Bonomi, Sara, Patrini, Maddalena, Bongiovanni, Giovanni, Malavasi, Lorenzo
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	The Royal Society of Chemistry 2020
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9055831/ https://www.ncbi.nlm.nih.gov/pubmed/35520057 http://dx.doi.org/10.1039/d0ra04680a

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