Cargando…
Gas-phase reaction mechanism in chemical dry etching using NF(3) and remotely discharged NH(3)/N(2) mixture
Modeling of dry etching processes requires a detailed understanding of the relevant reaction mechanisms. This study aims to elucidate the gas-phase mechanism of reactions in the chemical dry etching process of SiO(2) layers which is initiated by mixing NF(3) gas with the discharged flow of an NH(3)/...
| Autores principales: | , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2020
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9056326/ https://www.ncbi.nlm.nih.gov/pubmed/35516038 http://dx.doi.org/10.1039/d0ra05726f |