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Selective deposition of gold particles onto silicon at the nanoscale controlled by a femtosecond laser through galvanic displacement
Control of the deposition location and morphology of metals on semiconductors is of considerable importance for the fabrication of metal–semiconductor hybrid structures. For this purpose, selective nanoscale deposition of gold on silicon was successfully achieved by a two-step method in this paper....
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9058130/ https://www.ncbi.nlm.nih.gov/pubmed/35519705 http://dx.doi.org/10.1039/d0ra03059g |