Cargando…
Nucleic acid functionalized fiber optic probes for sensing in evanescent wave: optimization and application
Nucleic acid functionalized evanescent wave fiber optic (EWFO) biosensors have attracted much attention due to their remarkable advantages in both device configuration and sensing performance. One critical technique in EWFO biosensor fabrication is its surface modification, which requires (1) minima...
Autores principales: | , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2019
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9059834/ https://www.ncbi.nlm.nih.gov/pubmed/35516110 http://dx.doi.org/10.1039/c8ra10125f |
Sumario: | Nucleic acid functionalized evanescent wave fiber optic (EWFO) biosensors have attracted much attention due to their remarkable advantages in both device configuration and sensing performance. One critical technique in EWFO biosensor fabrication is its surface modification, which requires (1) minimal nonspecific adsorption and (2) high-quality DNA immobilization to guarantee satisfactory sensing performances. Focusing on these two requirements, a series of optimizations have been conducted in this work to develop reliable DNA-functionalized EWFO probes. Firstly, the surface planeness of EWFO probes were found to be greatly improved by a novel HF/HNO(3) mixture etching solution. Both atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were conducted to investigate the morphological structures and surface chemical compositions. Besides, EWFO sensing performances adopting moderate immobilization of irrelevant DNA were investigated for optimization purposes. Furthermore, a split aptamer based sandwich-type EWFO sensor was developed using adenosine (Ade) as the model target (LOD = 25 μM). To the best of our knowledge, this study is the first case to focus on the optimization of etching solution compositions in the fabrication of combination tapered fibers, which provides experimental basis for the understanding of the silica-etching mechanism using HF/HNO(3) mixture solution and may further inspire related researches. |
---|