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Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD
Morphology of 〈111〉-oriented 3C–SiC films was transformed from mosaic to whisker to cauliflower-like with the increased flow rate (f) of hexametyldisilane (HMDS) in the process of laser chemical vapor deposition (LCVD). The SiC whiskers were naturally sharp hexagonal pyramids with average height of...
| Autores principales: | , , , , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9059850/ https://www.ncbi.nlm.nih.gov/pubmed/35520524 http://dx.doi.org/10.1039/c8ra09509d |
| _version_ | 1784698392384897024 |
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| author | Xu, Qingfang Tu, Rong Sun, Qingyun Yang, Meijun Li, Qizhong Zhang, Song Zhang, Lianmeng Goto, Takashi Ohmori, Hitoshi Shi, Ji Li, Haiwen Kosinova, Marina Bikramjit, Basu |
| author_facet | Xu, Qingfang Tu, Rong Sun, Qingyun Yang, Meijun Li, Qizhong Zhang, Song Zhang, Lianmeng Goto, Takashi Ohmori, Hitoshi Shi, Ji Li, Haiwen Kosinova, Marina Bikramjit, Basu |
| author_sort | Xu, Qingfang |
| collection | PubMed |
| description | Morphology of 〈111〉-oriented 3C–SiC films was transformed from mosaic to whisker to cauliflower-like with the increased flow rate (f) of hexametyldisilane (HMDS) in the process of laser chemical vapor deposition (LCVD). The SiC whiskers were naturally sharp hexagonal pyramids with average height of 250 nm and an aspect ratio in the range of 5 to 10, with a density of 1.3 × 10(8) mm(−2). The influence mechanism of f on the surface morphology, as well as the growth mechanism of SiC whiskers, was discussed. |
| format | Online Article Text |
| id | pubmed-9059850 |
| institution | National Center for Biotechnology Information |
| language | English |
| publishDate | 2019 |
| publisher | The Royal Society of Chemistry |
| record_format | MEDLINE/PubMed |
| spelling | pubmed-90598502022-05-04 Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD Xu, Qingfang Tu, Rong Sun, Qingyun Yang, Meijun Li, Qizhong Zhang, Song Zhang, Lianmeng Goto, Takashi Ohmori, Hitoshi Shi, Ji Li, Haiwen Kosinova, Marina Bikramjit, Basu RSC Adv Chemistry Morphology of 〈111〉-oriented 3C–SiC films was transformed from mosaic to whisker to cauliflower-like with the increased flow rate (f) of hexametyldisilane (HMDS) in the process of laser chemical vapor deposition (LCVD). The SiC whiskers were naturally sharp hexagonal pyramids with average height of 250 nm and an aspect ratio in the range of 5 to 10, with a density of 1.3 × 10(8) mm(−2). The influence mechanism of f on the surface morphology, as well as the growth mechanism of SiC whiskers, was discussed. The Royal Society of Chemistry 2019-01-18 /pmc/articles/PMC9059850/ /pubmed/35520524 http://dx.doi.org/10.1039/c8ra09509d Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/ |
| spellingShingle | Chemistry Xu, Qingfang Tu, Rong Sun, Qingyun Yang, Meijun Li, Qizhong Zhang, Song Zhang, Lianmeng Goto, Takashi Ohmori, Hitoshi Shi, Ji Li, Haiwen Kosinova, Marina Bikramjit, Basu Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD |
| title | Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD |
| title_full | Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD |
| title_fullStr | Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD |
| title_full_unstemmed | Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD |
| title_short | Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD |
| title_sort | morphology controlling of 〈111〉-3c–sic films by hmds flow rate in lcvd |
| topic | Chemistry |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9059850/ https://www.ncbi.nlm.nih.gov/pubmed/35520524 http://dx.doi.org/10.1039/c8ra09509d |
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