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Influence of cooling-induced edge morphology evolution during chemical vapor deposition on H(2) etching of graphene domains
In this paper, we studied the influence of edge morphology evolution during the chemical vapor deposition cooling process on H(2) etching of graphene domains. Hexagonal graphene domains were synthesized on a Cu substrate and etched with H(2) at atmospheric pressure. After etching, two kinds of graph...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9060803/ https://www.ncbi.nlm.nih.gov/pubmed/35515905 http://dx.doi.org/10.1039/c8ra09265f |