Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas

Three polyurethanes with different contents of tetraaryl-buta-1,3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing ten...

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Detalles Bibliográficos
Autores principales: Wang, Kun, Wang, Meng, Lu, Hao, Liu, Beibei, Huang, Mingming, Yang, Jiping
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2019
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9062156/
https://www.ncbi.nlm.nih.gov/pubmed/35520748
http://dx.doi.org/10.1039/c8ra10486g
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author Wang, Kun
Wang, Meng
Lu, Hao
Liu, Beibei
Huang, Mingming
Yang, Jiping
author_facet Wang, Kun
Wang, Meng
Lu, Hao
Liu, Beibei
Huang, Mingming
Yang, Jiping
author_sort Wang, Kun
collection PubMed
description Three polyurethanes with different contents of tetraaryl-buta-1,3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing tensile stress. Also, polyurethanes with higher aggregation-induced emission fluorogen content had stronger mechano-fluorochromic behavior in the same tension state. Moreover, the resulting polyurethane films possessed high sensitivity for halogen acid gas, suggesting their potential applications in environmental monitoring fields.
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spelling pubmed-90621562022-05-04 Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas Wang, Kun Wang, Meng Lu, Hao Liu, Beibei Huang, Mingming Yang, Jiping RSC Adv Chemistry Three polyurethanes with different contents of tetraaryl-buta-1,3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing tensile stress. Also, polyurethanes with higher aggregation-induced emission fluorogen content had stronger mechano-fluorochromic behavior in the same tension state. Moreover, the resulting polyurethane films possessed high sensitivity for halogen acid gas, suggesting their potential applications in environmental monitoring fields. The Royal Society of Chemistry 2019-03-26 /pmc/articles/PMC9062156/ /pubmed/35520748 http://dx.doi.org/10.1039/c8ra10486g Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by/3.0/
spellingShingle Chemistry
Wang, Kun
Wang, Meng
Lu, Hao
Liu, Beibei
Huang, Mingming
Yang, Jiping
Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
title Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
title_full Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
title_fullStr Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
title_full_unstemmed Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
title_short Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas
title_sort mechano-fluorochromic behavior of aee polyurethane films and their high sensitivity to halogen acid gas
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9062156/
https://www.ncbi.nlm.nih.gov/pubmed/35520748
http://dx.doi.org/10.1039/c8ra10486g
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