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Thin layer broadband porous chromium black absorber fabricated through wet-etching process
A thin layer porous chromium (Cr) black absorber was fabricated on a polyimide (PI) substrate with 2 inch diameter and 500 nm thickness. The chromium black was prepared by electron beam evaporation and wet-etching process. To optimize the parameters of the absorber, the Cr black was firstly fabricat...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9064160/ https://www.ncbi.nlm.nih.gov/pubmed/35516328 http://dx.doi.org/10.1039/c9ra00559e |