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Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation
Formation of precise and high-resolution silica micropatterns on polymer substrates is of importance in surface structuring for flexible device fabrication of optics, microelectronic, and biotechnology. To achieve that, substrates modified with affinity-patterns serve as a strategy for site-selectiv...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9072887/ https://www.ncbi.nlm.nih.gov/pubmed/35530761 http://dx.doi.org/10.1039/c9ra07256j |
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author | Wu, Cheng-Tse Soliman, Ahmed I. A. Utsunomiya, Toru Ichii, Takashi Sugimura, Hiroyuki |
author_facet | Wu, Cheng-Tse Soliman, Ahmed I. A. Utsunomiya, Toru Ichii, Takashi Sugimura, Hiroyuki |
author_sort | Wu, Cheng-Tse |
collection | PubMed |
description | Formation of precise and high-resolution silica micropatterns on polymer substrates is of importance in surface structuring for flexible device fabrication of optics, microelectronic, and biotechnology. To achieve that, substrates modified with affinity-patterns serve as a strategy for site-selective deposition. In the present paper, vacuum ultraviolet (VUV) treatment is utilized to achieve spatially-controlled surface functionalization on a cyclo-olefin polymer (COP) substrate. An organosilane, 2,4,6,8-tetramethylcyclotetrasiloxane (TMCTS), preferentially deposits on the functionalized regions. Well-defined patterns of TMCTS are formed with a minimum feature of ∼500 nm. The secondary VUV/(O)-treatment converts TMCTS into SiO(x), meanwhile etches the bare COP surface, forming patterned SiO(x)/COP microstructures with an average height of ∼150 nm. The resulting SiO(x) patterns retain a good copy of TMCTS patterns, which are also consistent with the patterns of photomask used in polymer affinity-patterning. The high quality SiO(x) patterns are of interests in microdevice fabrication, and the hydrophilicity contrast and adjustable heights reveal their potential application as a “stamp” for microcontact printing (μCP) techniques. |
format | Online Article Text |
id | pubmed-9072887 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | The Royal Society of Chemistry |
record_format | MEDLINE/PubMed |
spelling | pubmed-90728872022-05-06 Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation Wu, Cheng-Tse Soliman, Ahmed I. A. Utsunomiya, Toru Ichii, Takashi Sugimura, Hiroyuki RSC Adv Chemistry Formation of precise and high-resolution silica micropatterns on polymer substrates is of importance in surface structuring for flexible device fabrication of optics, microelectronic, and biotechnology. To achieve that, substrates modified with affinity-patterns serve as a strategy for site-selective deposition. In the present paper, vacuum ultraviolet (VUV) treatment is utilized to achieve spatially-controlled surface functionalization on a cyclo-olefin polymer (COP) substrate. An organosilane, 2,4,6,8-tetramethylcyclotetrasiloxane (TMCTS), preferentially deposits on the functionalized regions. Well-defined patterns of TMCTS are formed with a minimum feature of ∼500 nm. The secondary VUV/(O)-treatment converts TMCTS into SiO(x), meanwhile etches the bare COP surface, forming patterned SiO(x)/COP microstructures with an average height of ∼150 nm. The resulting SiO(x) patterns retain a good copy of TMCTS patterns, which are also consistent with the patterns of photomask used in polymer affinity-patterning. The high quality SiO(x) patterns are of interests in microdevice fabrication, and the hydrophilicity contrast and adjustable heights reveal their potential application as a “stamp” for microcontact printing (μCP) techniques. The Royal Society of Chemistry 2019-10-10 /pmc/articles/PMC9072887/ /pubmed/35530761 http://dx.doi.org/10.1039/c9ra07256j Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/ |
spellingShingle | Chemistry Wu, Cheng-Tse Soliman, Ahmed I. A. Utsunomiya, Toru Ichii, Takashi Sugimura, Hiroyuki Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation |
title | Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation |
title_full | Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation |
title_fullStr | Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation |
title_full_unstemmed | Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation |
title_short | Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation |
title_sort | formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation |
topic | Chemistry |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9072887/ https://www.ncbi.nlm.nih.gov/pubmed/35530761 http://dx.doi.org/10.1039/c9ra07256j |
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