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Local atomic order of the amorphous TaO(x) thin films in relation to their chemical resistivity
The experimental and theoretical studies of the local atomic order and chemical binding in tantalum oxide amorphous films are presented. The experimental studies were performed on thin films deposited at the temperature of 100 °C by atomic layer deposition on silicon (100) and glass substrates. Thin...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9074777/ https://www.ncbi.nlm.nih.gov/pubmed/35528056 http://dx.doi.org/10.1039/c9ra07318c |