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Local atomic order of the amorphous TaO(x) thin films in relation to their chemical resistivity

The experimental and theoretical studies of the local atomic order and chemical binding in tantalum oxide amorphous films are presented. The experimental studies were performed on thin films deposited at the temperature of 100 °C by atomic layer deposition on silicon (100) and glass substrates. Thin...

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Detalles Bibliográficos
Autores principales:	Lawniczak-Jablonska, Krystyna, Wolska, Anna, Kuzmiuk, Piotr, Rejmak, Pawel, Kosiel, Kamil
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	The Royal Society of Chemistry 2019
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9074777/ https://www.ncbi.nlm.nih.gov/pubmed/35528056 http://dx.doi.org/10.1039/c9ra07318c

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