Tunable graphene doping by modulating the nanopore geometry on a SiO(2)/Si substrate

A tunable graphene doping method utilizing a SiO(2)/Si substrate with nanopores (NP) was introduced. Laser interference lithography (LIL) using a He–Cd laser (λ = 325 nm) was used to prepare pore size- and pitch-controllable NP SiO(2)/Si substrates. Then, bottom-contact graphene field effect transis...

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Detalles Bibliográficos
Autores principales: Lim, Namsoo, Yoo, Tae Jin, Kim, Jin Tae, Pak, Yusin, Kumaresan, Yogeenth, Kim, Hyeonghun, Kim, Woochul, Lee, Byoung Hun, Jung, Gun Young
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9078577/
https://www.ncbi.nlm.nih.gov/pubmed/35541886
http://dx.doi.org/10.1039/c7ra11601b

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9078577/
https://www.ncbi.nlm.nih.gov/pubmed/35541886
http://dx.doi.org/10.1039/c7ra11601b

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