EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer

A detailed investigation to understand the mechanism of the resist action at a fundamental level is essential for future Extreme Ultraviolet Lithography (EUVL) resists. The photodynamics study of a newly developed hybrid nonchemically amplified 2.15%-MAPDSA–MAPDST resist using synchrotron radiation...

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Detalles Bibliográficos
Autores principales: Moura, Cleverson Alves da Silva, Belmonte, Guilherme Kretzmann, Reddy, Pulikanti Guruprasad, Gonslaves, Kenneth E., Weibel, Daniel Eduardo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9078975/
https://www.ncbi.nlm.nih.gov/pubmed/35541508
http://dx.doi.org/10.1039/c7ra12934c

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