Growth promotion of vertical graphene on SiO(2)/Si by Ar plasma process in plasma-enhanced chemical vapor deposition

This study investigates the growth promotion of vertically oriented graphene in plasma-enhanced chemical vapor deposition through Ar plasma treatment. Combined with various substrate treatments, including hydrofluoric acid etching and oxidation after Ar plasma treatment, Ar plasma pretreatment promo...

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Detalles Bibliográficos
Autores principales: Sui, Yanping, Chen, Zhiying, Zhang, Yanhui, Hu, Shike, Liang, Yijian, Ge, Xiaoming, Li, Jing, Yu, Guanghui, Peng, Songang, Jin, Zhi, Liu, Xinyu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9080714/
https://www.ncbi.nlm.nih.gov/pubmed/35539632
http://dx.doi.org/10.1039/c8ra00869h

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9080714/
https://www.ncbi.nlm.nih.gov/pubmed/35539632
http://dx.doi.org/10.1039/c8ra00869h

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