Cargando…

Growth promotion of vertical graphene on SiO(2)/Si by Ar plasma process in plasma-enhanced chemical vapor deposition

This study investigates the growth promotion of vertically oriented graphene in plasma-enhanced chemical vapor deposition through Ar plasma treatment. Combined with various substrate treatments, including hydrofluoric acid etching and oxidation after Ar plasma treatment, Ar plasma pretreatment promo...

Descripción completa

Detalles Bibliográficos
Autores principales:	Sui, Yanping, Chen, Zhiying, Zhang, Yanhui, Hu, Shike, Liang, Yijian, Ge, Xiaoming, Li, Jing, Yu, Guanghui, Peng, Songang, Jin, Zhi, Liu, Xinyu
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	The Royal Society of Chemistry 2018
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9080714/ https://www.ncbi.nlm.nih.gov/pubmed/35539632 http://dx.doi.org/10.1039/c8ra00869h

Ejemplares similares

Direct Synthesis of Graphene Dendrites on SiO(2)/Si Substrates by Chemical Vapor Deposition
por: Li, Yingxian, et al.
Publicado: (2020)

Graphene Growth Directly on SiO(2)/Si by Hot Filament Chemical Vapor Deposition
por: Rodríguez-Villanueva, Sandra, et al.
Publicado: (2021)

The direct growth of planar and vertical graphene on Si(100) via microwave plasma chemical vapor deposition: synthesis conditions effects
por: Meškinis, Š., et al.
Publicado: (2022)

Systematic Study of the SiO(x) Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO(x)/SiO(2) Super-Lattice
por: Ma, Hong-Ping, et al.
Publicado: (2019)

Compositional and optical properties of SiO( x ) films and (SiO( x )/SiO( y )) junctions deposited by HFCVD
por: Vázquez-Valerdi, Diana E, et al.
Publicado: (2014)

High throughput production of nanocomposite SiO(x) powders by plasma spray physical vapor deposition for negative electrode of lithium ion batteries
por: Homma, Keiichiro, et al.
Publicado: (2014)

Chemical vapor deposition merges MoS(2) grains into high-quality and centimeter-scale films on Si/SiO(2)
por: Singh, Mukesh, et al.
Publicado: (2022)

Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene
por: Lukose, R., et al.
Publicado: (2021)

Insights into the Mechanism for Vertical Graphene Growth by Plasma-Enhanced Chemical Vapor Deposition
por: Sun, Jie, et al.
Publicado: (2022)

Advancements in Plasma-Enhanced Chemical Vapor Deposition for Producing Vertical Graphene Nanowalls
por: Bertran-Serra, Enric, et al.
Publicado: (2023)

Stability of SiN(x) Prepared by Plasma-Enhanced Chemical Vapor Deposition at Low Temperature
por: Zhang, Chi, et al.
Publicado: (2021)

Database Development of SiO(2) Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe
por: Lee, Youngseok, et al.
Publicado: (2022)

Instantaneous formation of SiO(x) nanocomposite for high capacity lithium ion batteries by enhanced disproportionation reaction during plasma spray physical vapor deposition
por: Tashiro, Tohru, et al.
Publicado: (2016)

Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene
por: Lukose, R., et al.
Publicado: (2021)

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO(2) Using Carbon Dioxide
por: Zhu, Zhen, et al.
Publicado: (2019)

Deposition and Characterization of RP-ALD SiO(2) Thin Films with Different Oxygen Plasma Powers
por: Zhang, Xiao-Ying, et al.
Publicado: (2021)

Selective isotropic etching of SiO(2) over Si(3)N(4) using NF(3)/H(2) remote plasma and methanol vapor
por: Gil, Hong Seong, et al.
Publicado: (2023)

Heteroepitaxial diamond growth on 4H-SiC using microwave plasma chemical vapor deposition
por: Moore, Eric, et al.
Publicado: (2017)

Investigation of SiO(2) Etch Characteristics by C(6)F(6)/Ar/O(2) Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma
por: Sung, Dain, et al.
Publicado: (2022)

Fabrication of Carbon Nanotube/SiO(2)and Carbon Nanotube/SiO(2)/Ag Nanoparticles Hybrids by Using Plasma Treatment
por: Li, Haiqing, et al.
Publicado: (2009)

Effect of Substrate Types on the Structure of Vertical Graphene Prepared by Plasma-Enhanced Chemical Vapor Deposition
por: Xie, Siyi, et al.
Publicado: (2021)

New functional material: spark plasma sintered Si/SiO(2) nanoparticles – fabrication and properties
por: Dorokhin, M. V., et al.
Publicado: (2019)

Substrate-Induced Variances in Morphological and Structural Properties of MoS(2) Grown by Chemical Vapor Deposition on Epitaxial Graphene and SiO(2)
por: Sitek, Jakub, et al.
Publicado: (2020)

Synthesis and Luminescence Properties of Core-Shell-Shell Composites: SiO(2)@PMDA-Si-Tb@SiO(2) and SiO(2)@PMDA-Si-Tb-phen@SiO(2)
por: Feng, Lina, et al.
Publicado: (2019)

Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO(2) and TiO(2)
por: Arts, Karsten, et al.
Publicado: (2021)

Effect of vertically oriented few-layer graphene on the wettability and interfacial reactions of the AgCuTi-SiO(2f)/SiO(2) system
por: Sun, Z., et al.
Publicado: (2017)

Characterization of ultrathin InSb nanocrystals film deposited on SiO(2)/Si substrate
por: Li, Dengyue, et al.
Publicado: (2011)

Controllable Fabrication of Vertical Graphene with Tunable Growth Nature by Remote Plasma-Enhanced Chemical Vapor Deposition
por: Zhang, Tian-Tian, et al.
Publicado: (2023)

SiO-induced thermal instability and interplay between graphite and SiO in graphite/SiO composite anode
por: Lee, Ban Seok, et al.
Publicado: (2023)

Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiN(x) for Low Temperature Thin Film Encapsulation
por: An, Kunsik, et al.
Publicado: (2020)

Water vapor and CMAS corrosion tests of Y(2)SiO(5)/Si thermal and environmental barrier coating
por: Zhang, Qi, et al.
Publicado: (2022)

Controlled synthesis and luminescence properties of core-shell-shell structured SiO(2)@AIPA-S-Si-Eu@SiO(2) and SiO(2)@AIPA-S-Si-Eu-phen@SiO(2) nanocomposites
por: Qiao, Yan, et al.
Publicado: (2020)

Densification in transparent SiO(2) glasses prepared by spark plasma sintering
por: Masai, Hirokazu, et al.
Publicado: (2022)

Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO(2)
por: Lee, Youngseok, et al.
Publicado: (2022)

Synthesis and photoluminescence properties of silica-modified SiO(2)@ANA-Si-Tb@SiO(2), SiO(2)@ANA-Si-Tb-L@SiO(2) core–shell–shell nanostructured composites
por: Feng, Lina, et al.
Publicado: (2019)

Interface properties of SiO(x)N(y) layer on Si prepared by atmospheric-pressure plasma oxidation-nitridation
por: Zhuo, Zeteng, et al.
Publicado: (2013)

Effects of Charge Trapping at the MoS(2)–SiO(2) Interface on the Stability of Subthreshold Swing of MoS(2) Field Effect Transistors
por: Huang, Xinnan, et al.
Publicado: (2020)

Catalyst-Less and Transfer-Less Synthesis of Graphene on Si(100) Using Direct Microwave Plasma Enhanced Chemical Vapor Deposition and Protective Enclosures
por: Gudaitis, Rimantas, et al.
Publicado: (2020)

Low-energy Ar(+) and N(+) ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films
por: Yoshimura, Satoru, et al.
Publicado: (2021)

Strong piezoelectricity in single-layer graphene deposited on SiO(2) grating substrates
por: da Cunha Rodrigues, Gonçalo, et al.
Publicado: (2015)

Cannot write session to /tmp/vufind_sessions/sess_uu9fhgt2p5vpffrhtau5fot0t0